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公开(公告)号:US20220216285A1
公开(公告)日:2022-07-07
申请号:US17608972
申请日:2020-03-30
Applicant: Samsung Display Co., Ltd.
Inventor: Jong-Oh SEO , Ji-Hwan KIM , Byung-Soo SO , Dong-Min LEE , Jong-Hoon CHOI
Abstract: A method of manufacturing a display device including forming a polysilicon layer on a substrate, patterning the polysilicon layer to form a polysilicon pattern including a first region and a second region each having a first thickness, and a third region having a second thickness less than the first thickness, forming a gate insulation layer on the polysilicon pattern, forming a gate electrode on the gate insulation layer, partially implanting ions into the polysilicon pattern to form an active layer, forming an insulation interlayer on the gate electrode, forming source and drain contact holes each passing through the insulation interlayer and the gate insulation layer and respectively overlapping the first region and the second region, forming source and drain electrodes respectively filling the source and drain contact holes, and forming a light emitting element electrically connected to the source electrode or the drain electrode.
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公开(公告)号:US20200328237A1
公开(公告)日:2020-10-15
申请号:US16808157
申请日:2020-03-03
Applicant: Samsung Display Co., Ltd.
Inventor: Dong-min LEE , Ji-Hwan KIM , Jongoh SEO , Byung Soo SO , Dong-Sung LEE , Jonghoon CHOI
Abstract: A laser apparatus includes a laser generator configured to generate a first laser beam proceeding along a first direction, and an inversion module configured to convert the first laser beam to a second laser beam proceeding along the first direction, the inversion module including a splitter configured to form a reflected laser beam by partially reflecting the first laser beam, and a transmitted laser beam by partially transmitting the first laser beam, and a prism configured to reflect the reflected laser beam.
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公开(公告)号:US20230119285A1
公开(公告)日:2023-04-20
申请号:US17892342
申请日:2022-08-22
Applicant: Samsung Display Co., LTD.
Inventor: Ji-Hwan KIM , Hiroshi OKUMURA
IPC: H01L21/02
Abstract: A crystallization method of amorphous silicon includes forming amorphous silicon on a substrate; first-irradiating a laser beam on the amorphous silicon while moving the substrate in a first direction; moving a position of the substrate in a second direction perpendicular to the first direction, and second-irradiating a laser beam on the amorphous silicon while moving the substrate in an opposite direction to the first direction.
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公开(公告)号:US20220173134A1
公开(公告)日:2022-06-02
申请号:US17672574
申请日:2022-02-15
Applicant: Samsung Display Co., Ltd.
Inventor: Dong-min LEE , Ji-Hwan KIM , Jongoh SEO , Byung Soo SO , Dong-Sung LEE , Jonghoon CHOI
Abstract: A laser apparatus includes a laser generator configured to generate a first laser beam proceeding along a first direction, and an inversion module configured to convert the first laser beam to a second laser beam proceeding along the first direction, the inversion module including a splitter configured to form a reflected laser beam by partially reflecting the first laser beam, and a transmitted laser beam by partially transmitting the first laser beam, and a prism configured to reflect the reflected laser beam.
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公开(公告)号:US20210057218A1
公开(公告)日:2021-02-25
申请号:US16997454
申请日:2020-08-19
Applicant: Samsung Display Co., Ltd.
Inventor: Dong-Min LEE , Ji-Hwan KIM , Jongoh SEO , Byung Soo SO
IPC: H01L21/02 , H01L21/268 , H01L21/67
Abstract: A laser annealing device includes a stage, a laser generator, and a reflective member. The stage supports a substrate with a thin film formed thereon to be processed, and may be moved in a first direction at a set or predetermined speed. The laser generator irradiates a first area of the thin film with a laser beam while the stage is moved. The reflective member reflects a part of the laser beam, which is reflected from the first area of the thin film, to a second area of the thin film. The first area and the second area are spaced apart from each other.
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