DEPOSITION APPARATUS
    3.
    发明公开

    公开(公告)号:US20240060172A1

    公开(公告)日:2024-02-22

    申请号:US18203702

    申请日:2023-05-31

    CPC classification number: C23C14/50 C23C14/042 C23C14/24

    Abstract: A deposition apparatus for depositing a deposition material on a base substrate disposed on a mask, includes: a mask assembly including a mask frame which defines an opening therein and surrounds the opening, and the mask disposed on the mask frame; an electrostatic chuck disposed on the base substrate; and a plate disposed on the electrostatic chuck. The electrostatic chuck includes a plurality of magnetic bodies, and a magnetic property of at least one magnetic body among the plurality of magnetic bodies is different from a magnetic property of remaining magnetic bodies except for the at least one magnetic body among the plurality of magnetic bodies.

    MAGNET ASSEMBLY, DEPOSITION DEVICE INCLUDING MAGNET ASSEMBLY, AND DEPOSITION METHOD USING DEPOSITION DEVICE

    公开(公告)号:US20250054668A1

    公开(公告)日:2025-02-13

    申请号:US18666208

    申请日:2024-05-16

    Abstract: A magnet assembly includes a yoke plate disposed on a plane, and a magnetic field generator which is disposed on the yoke plate and includes magnet parts including magnet units, magnetic bodies, and non-magnetic bodies. The magnetic bodies overlap the magnet parts in a plan view. The non-magnetic bodies overlap an area between the magnet units in a plan view. The magnet assembly operates in one of a first mode and a second mode. The magnetic field generator generates a magnetic field below the magnetic bodies and the non-magnetic bodies in the first mode and does not substantially generate the magnetic field below the magnetic bodies and the non-magnetic bodies in the second mode.

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