MASKS, METHOD TO INSPECT AND ADJUST MASK POSITION, AND METHOD TO PATTERN PIXELS OF ORGANIC LIGHT-EMITTING DISPLAY DEVICE UTILIZING THE MASKS
    4.
    发明申请
    MASKS, METHOD TO INSPECT AND ADJUST MASK POSITION, AND METHOD TO PATTERN PIXELS OF ORGANIC LIGHT-EMITTING DISPLAY DEVICE UTILIZING THE MASKS 有权
    掩蔽,检查和调整掩蔽位置的方法,以及使用有机发光显示装置的图案的方法

    公开(公告)号:US20160343944A1

    公开(公告)日:2016-11-24

    申请号:US14883989

    申请日:2015-10-15

    Abstract: A method for pixel patterning and pixel position inspection of an organic light-emitting display device includes: forming, on a substrate using a first mask, a thin film layer of a first color corresponding to a first pixel pattern and a first pixel positioning pattern for inspecting a position of a first pixel; shifting, by a determined pitch, the first mask from a position associated with forming the thin film layer of the first color; aligning the shifted first mask with respect to the substrate; and forming, on the substrate using the shifted first mask, a thin film layer of a second color corresponding to the first pixel pattern and another first pixel positioning pattern for inspecting a position of a second pixel.

    Abstract translation: 一种用于有机发光显示装置的像素构图和像素位置检查的方法包括:在基板上使用第一掩模形成对应于第一像素图案的第一颜色的薄膜层和用于 检查第一像素的位置; 从与形成第一颜色的薄膜层相关联的位置移位确定的间距的第一掩模; 使偏移的第一掩模相对于基底对准; 以及使用所述移位的第一掩模在所述基板上形成对应于所述第一像素图案的第二颜色的薄膜层和用于检查第二像素的位置的另一第一像素定位图案。

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