公开(公告)号：US20170288143A1

公开(公告)日：2017-10-05

申请号：US15630877

申请日：2017-06-22

Applicant: Samsung Display Co., Ltd.

Inventor： Sangshin LEE ,  Dongjin HA ,  Mingoo KANG ,  Ohseob KWON ,  Sangmin YI

IPC: H01L51/00 ,  H01L51/56 ,  H01L27/32

CPC classification number: H01L51/0011 ,  H01L27/3211 ,  H01L27/3223 ,  H01L51/5012 ,  H01L51/5088 ,  H01L51/56

Abstract: A method for pixel patterning and pixel position inspection of an organic light-emitting display device includes: forming, on a substrate using a first mask, a thin film layer of a first color corresponding to a first pixel pattern and a first pixel positioning pattern for inspecting a position of a first pixel; shifting, by a determined pitch, the first mask from a position associated with forming the thin film layer of the first color; aligning the shifted first mask with respect to the substrate; and forming, on the substrate using the shifted first mask, a thin film layer of a second color corresponding to the first pixel pattern and another first pixel positioning pattern for inspecting a position of a second pixel.

公开(公告)号：US20200185608A1

公开(公告)日：2020-06-11

申请号：US16792581

申请日：2020-02-17

Applicant: Samsung Display Co., Ltd.

Inventor： Sangshin LEE ,  Dongjin HA ,  Mingoo KANG ,  Ohseob KWON ,  Sangmin YI

IPC: H01L51/00 ,  H01L27/32 ,  H01L51/56

Abstract: A method for pixel patterning and pixel position inspection of an organic light-emitting display device includes: forming, on a substrate using a first mask, a thin film layer of a first color corresponding to a first pixel pattern and a first pixel positioning pattern for inspecting a position of a first pixel; shifting, by a determined pitch, the first mask from a position associated with forming the thin film layer of the first color; aligning the shifted first mask with respect to the substrate; and forming, on the substrate using the shifted first mask, a thin film layer of a second color corresponding to the first pixel pattern and another first pixel positioning pattern for inspecting a position of a second pixel.

公开(公告)号：US20160343944A1

公开(公告)日：2016-11-24

申请号：US14883989

申请日：2015-10-15

Applicant: Samsung Display Co., Ltd.

Inventor： Sangshin LEE ,  Dongjin HA ,  Mingoo KANG ,  Ohseob KWON ,  Sangmin YI

IPC: H01L51/00 ,  H01L27/32 ,  H01L51/56

CPC classification number: H01L51/0011 ,  H01L27/3211 ,  H01L27/3223 ,  H01L51/5012 ,  H01L51/5088 ,  H01L51/56

Abstract: A method for pixel patterning and pixel position inspection of an organic light-emitting display device includes: forming, on a substrate using a first mask, a thin film layer of a first color corresponding to a first pixel pattern and a first pixel positioning pattern for inspecting a position of a first pixel; shifting, by a determined pitch, the first mask from a position associated with forming the thin film layer of the first color; aligning the shifted first mask with respect to the substrate; and forming, on the substrate using the shifted first mask, a thin film layer of a second color corresponding to the first pixel pattern and another first pixel positioning pattern for inspecting a position of a second pixel.

Abstract translation: 一种用于有机发光显示装置的像素构图和像素位置检查的方法包括：在基板上使用第一掩模形成对应于第一像素图案的第一颜色的薄膜层和用于 检查第一像素的位置; 从与形成第一颜色的薄膜层相关联的位置移位确定的间距的第一掩模; 使偏移的第一掩模相对于基底对准; 以及使用所述移位的第一掩模在所述基板上形成对应于所述第一像素图案的第二颜色的薄膜层和用于检查第二像素的位置的另一第一像素定位图案。

公开(公告)号：US20160144393A1

公开(公告)日：2016-05-26

申请号：US14798735

申请日：2015-07-14

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Ohseob KWON

IPC: B05B15/04 ,  G03F7/40

CPC classification number: G03F7/40 ,  B05C21/005 ,  C23C14/042 ,  C23C16/042 ,  H01L51/00 ,  H01L51/0011

Abstract: A mask assembly for thin film deposition, the mask assembly, including a mask frame having an opening; a mask coupled to the mask frame and having a first surface facing a substrate and a second surface opposite to the first surface, a plurality of deposition pattern portions, and a rib between the adjacent deposition pattern portions, the mask having a partially etched area, the plurality of deposition pattern portions being within the partially etched area; and a partial etching extension portion in an outer portion of an area corresponding to the plurality of deposition pattern portions.

Abstract translation: 一种用于薄膜沉积的掩模组件，所述掩模组件包括具有开口的掩模框架; 掩模，其耦合到所述掩模框架并且具有面向基板的第一表面和与所述第一表面相对的第二表面，多个沉积图案部分和相邻沉积图案部分之间的肋，所述掩模具有部分蚀刻区域， 所述多个沉积图案部分在所述部分蚀刻区域内; 以及在与多个沉积图案部分对应的区域的外部部分中的局部蚀刻延伸部分。