公开(公告)号：US20240376589A1

公开(公告)日：2024-11-14

申请号：US18654930

申请日：2024-05-03

Applicant: Samsung Display Co., LTD.

Inventor： SANGMIN JUNG ,  MIN- GYU SEO ,  EUGENE KANG ,  HWAPYEONG JEONG ,  DONGKIUN SEO ,  CHULHWAN AN

IPC: C23C14/24 ,  C23C14/54

Abstract: A deposition source includes a crucible, a plurality of nozzles, a housing, a lower heater module, an upper heater module, a first electrode, a second electrode, and a power supply. The crucible accommodates a deposition material. The plurality of nozzles is disposed on the crucible and spaced apart from each other along a first direction. The housing accommodates the crucible and the plurality of nozzles. The lower heater module is disposed in an inner space of the housing to surround the crucible. The upper heater module is disposed on the lower heater module. The first electrode extends in a second direction crossing the first direction and is connected to the lower heater module. The second electrode extends in the second direction. The second electrode is connected to the upper heater module. The power supply is electrically connected to the first electrode and the second electrode.

公开(公告)号：US20240316571A1

公开(公告)日：2024-09-26

申请号：US18517852

申请日：2023-11-22

Applicant: Samsung Display Co., Ltd.

Inventor： YOUNG-HUN PARK ,  EUGENE KANG ,  CHANGWOOK SEO ,  SEUNG GEUN YUN

IPC: B03C1/06 ,  B03C1/033

CPC classification number: B03C1/06 ,  B03C1/0332

Abstract: A substrate treating apparatus includes a chamber defining a chamber cavity, a substrate carrier movable in a first direction inside of the chamber cavity, and a filter disposed inside the chamber cavity, defining an opening through which the substrate carrier passes, and including a magnet filter disposed in the opening and being rotatable.