公开(公告)号：US20240316571A1

公开(公告)日：2024-09-26

申请号：US18517852

申请日：2023-11-22

Applicant: Samsung Display Co., Ltd.

Inventor： YOUNG-HUN PARK ,  EUGENE KANG ,  CHANGWOOK SEO ,  SEUNG GEUN YUN

IPC: B03C1/06 ,  B03C1/033

CPC classification number: B03C1/06 ,  B03C1/0332

Abstract: A substrate treating apparatus includes a chamber defining a chamber cavity, a substrate carrier movable in a first direction inside of the chamber cavity, and a filter disposed inside the chamber cavity, defining an opening through which the substrate carrier passes, and including a magnet filter disposed in the opening and being rotatable.