公开(公告)号：US20240082810A1

公开(公告)日：2024-03-14

申请号：US18274251

申请日：2022-01-29

Applicant: SUD CHEMIE INDIA PVT LTD

Inventor： Rekha Sree ,  Rajesh Gopinath ,  Sreekala Rugmini ,  Kishore Ravindran ,  Surya Prakash Babu ,  Iskander Altaf Lalljee ,  Arshia Altaf Lalljee

IPC: B01J20/04 ,  B01D53/02 ,  B01J20/12 ,  B01J20/28 ,  B01J20/30

CPC classification number: B01J20/043 ,  B01D53/02 ,  B01J20/12 ,  B01J20/28004 ,  B01J20/28011 ,  B01J20/28019 ,  B01J20/2803 ,  B01J20/28059 ,  B01J20/28071 ,  B01J20/3007 ,  B01J20/3021 ,  B01J20/3078 ,  B01D2253/112 ,  B01D2253/304 ,  B01D2253/306 ,  B01D2253/311 ,  B01D2257/2045

Abstract: The present invention discloses an adsorbent composition for removing halogen-containing contaminants such as hydrogen chloride from gas streams and a process for its formation. The adsorbent composition comprises an active metal component and a carrier or binder. The active metal component is selected from the group consisting of sodium, potassium, magnesium, calcium and barium and the carrier/binder is selected from a group of clay materials like sepiolite, montmorillonite, kaolin or attapulgite.