SEMICONDUCTOR DEVICE AND SOLID-STATE IMAGE SENSOR

    公开(公告)号:US20220181377A1

    公开(公告)日:2022-06-09

    申请号:US17436985

    申请日:2020-01-07

    发明人: YOSUKE NITTA

    IPC分类号: H01L27/146

    摘要: A semiconductor device (50) according to the present disclosure includes: a first substrate (20) configured to be individualized and include a first semiconductor circuit (LOG) including a first terminal (25); and a second substrate (10) configured to include a second semiconductor circuit (PIX) including a second terminal (16), in which the first terminal (25) and the second terminal (16) are joined, and the second substrate (10) includes: a first insulating layer (13) that is arranged above the second substrate (10), and a second insulating layer (14) that is arranged at least partially above the first insulating layer (13) and in which the second terminal (16) is arranged.

    SOLID-STATE IMAGING DEVICE AND METHOD FOR MANUFACTURING SAME, AND ELECTRONIC INSTRUMENT

    公开(公告)号:US20240006437A1

    公开(公告)日:2024-01-04

    申请号:US18252839

    申请日:2021-11-08

    摘要: While improving the bonding strength between a plurality of semiconductor substrates, the passage of noise from one of the plurality of semiconductor substrates to another is suppressed. A solid-state imaging device includes a first semiconductor substrate including a first semiconductor layer in which a photoelectric conversion unit is formed, and a first multilayer wiring layer including an interlayer insulating film, a second semiconductor substrate including a second semiconductor layer in which a circuit is formed and a second multilayer wiring layer including an interlayer insulating film, the second multilayer wiring layer being bonded to the first multilayer wiring layer, a light shielding layer provided in at least one of the first multilayer wiring layer or the second multilayer wiring layer so as to be exposed to a bonding surface between the first multilayer wiring layer and the second multilayer wiring layer, and an antioxidant layer provided in at least one of the first multilayer wiring layer or the second multilayer wiring layer and provided at least either between the light shielding layer and the interlayer insulating film of the first multilayer wiring layer or between the light shielding layer and the interlayer insulating film of the second multilayer wiring layer.