SOLID-STATE IMAGING DEVICE, MANUFACTURING METHOD THEREOF, AND ELECTRONIC APPARATUS
    1.
    发明申请
    SOLID-STATE IMAGING DEVICE, MANUFACTURING METHOD THEREOF, AND ELECTRONIC APPARATUS 审中-公开
    固态成像装置及其制造方法及电子装置

    公开(公告)号:US20170053961A1

    公开(公告)日:2017-02-23

    申请号:US15342081

    申请日:2016-11-02

    Abstract: Disclosed herein is a solid-state imaging device including: a laminated semiconductor chip configured to be obtained by bonding two or more semiconductor chip sections to each other and be obtained by bonding at least a first semiconductor chip section in which a pixel array and a multilayer wiring layer are formed and a second semiconductor chip section in which a logic circuit and a multilayer wiring layer are formed to each other in such a manner that the multilayer wiring layers are opposed to each other and are electrically connected to each other; and a light blocking layer configured to be formed by an electrically-conductive film of the same layer as a layer of a connected interconnect of one or both of the first and second semiconductor chip sections near bonding between the first and second semiconductor chip sections. The solid-state imaging device is a back-illuminated solid-state imaging device.

    Abstract translation: 本文公开了一种固态成像装置,其包括:层叠半导体芯片,其被配置为通过将两个或更多个半导体芯片部彼此接合而获得,并且可以通过至少接合第一半导体芯片部分获得,所述第一半导体芯片部分中的像素阵列和多层 形成布线层,其中以多层布线层彼此相对并彼此电连接的方式彼此形成逻辑电路和多层布线层的第二半导体芯片部分; 以及遮光层,被配置为由与第一和第二半导体芯片部分之间接近接合的第一和第二半导体芯片部分之一或两者的连接互连层的相同层的导电膜形成。 固态成像装置是背照式固态成像装置。

    Solid-state imaging device, manufacturing method thereof, and electronic apparatus
    2.
    发明授权
    Solid-state imaging device, manufacturing method thereof, and electronic apparatus 有权
    固态成像装置及其制造方法以及电子装置

    公开(公告)号:US09171875B2

    公开(公告)日:2015-10-27

    申请号:US14168524

    申请日:2014-01-30

    Abstract: Disclosed herein is a solid-state imaging device including: a laminated semiconductor chip configured to be obtained by bonding two or more semiconductor chip sections to each other and be obtained by bonding at least a first semiconductor chip section in which a pixel array and a multilayer wiring layer are formed and a second semiconductor chip section in which a logic circuit and a multilayer wiring layer are formed to each other in such a manner that the multilayer wiring layers are opposed to each other and are electrically connected to each other; and a light blocking layer configured to be formed by an electrically-conductive film of the same layer as a layer of a connected interconnect of one or both of the first and second semiconductor chip sections near bonding between the first and second semiconductor chip sections. The solid-state imaging device is a back-illuminated solid-state imaging device.

    Abstract translation: 本文公开了一种固态成像装置,其包括:层叠半导体芯片,其被配置为通过将两个或更多个半导体芯片部彼此接合而获得,并且可以通过至少接合第一半导体芯片部分而获得,其中,第一半导体芯片部分中的像素阵列和多层 形成布线层,其中以多层布线层彼此相对并彼此电连接的方式彼此形成逻辑电路和多层布线层的第二半导体芯片部分; 以及遮光层,被配置为由与第一和第二半导体芯片部分之间接近接合的第一和第二半导体芯片部分之一或两者的连接互连层的相同层的导电膜形成。 固态成像装置是背照式固态成像装置。

    Solid-state imaging device and method for manufacturing the same
    3.
    发明授权
    Solid-state imaging device and method for manufacturing the same 有权
    固态成像装置及其制造方法

    公开(公告)号:US09082898B2

    公开(公告)日:2015-07-14

    申请号:US14035624

    申请日:2013-09-24

    Abstract: A solid-state imaging device includes: a light-receiving pixel part configured to be formed on a semiconductor substrate; a black-level reference pixel part configured to be formed on the semiconductor substrate; and a multilayer interconnect part configured to be provided over the semiconductor substrate. The multilayer interconnect part includes an insulating layer formed over the semiconductor substrate and metal interconnect layers formed as a plurality of layers in the insulating layer. The multilayer interconnect part has a first light-blocking film formed above an area between first metal interconnects of a first metal interconnect layer as one of the metal interconnect layers above the black-level reference pixel part, and a second light-blocking film that is connected to the first light-blocking film and is formed of a second metal interconnect layer over the first metal interconnect layer.

    Abstract translation: 固态成像装置包括:被配置为形成在半导体衬底上的受光像素部分; 配置为形成在所述半导体衬底上的黑色级参考像素部分; 以及被构造成设置在所述半导体衬底上的多层互连部件。 多层互连部分包括形成在半导体衬底上的绝缘层和在绝缘层中形成为多层的金属互连层。 多层互连部分具有形成在第一金属互连层的第一金属互连之间的区域上方的第一遮光膜,作为黑色等级参考像素部分上方的金属互连层之一,以及第二遮光膜, 连接到第一遮光膜并且由第一金属互连层上的第二金属互连层形成。

    Solid-state imaging device, manufacturing method thereof, and electronic apparatus

    公开(公告)号:US09496307B2

    公开(公告)日:2016-11-15

    申请号:US14867476

    申请日:2015-09-28

    Abstract: Disclosed herein is a solid-state imaging device including: a laminated semiconductor chip configured to be obtained by bonding two or more semiconductor chip sections to each other and be obtained by bonding at least a first semiconductor chip section in which a pixel array and a multilayer wiring layer are formed and a second semiconductor chip section in which a logic circuit and a multilayer wiring layer are formed to each other in such a manner that the multilayer wiring layers are opposed to each other and are electrically connected to each other; and a light blocking layer configured to be formed by an electrically-conductive film of the same layer as a layer of a connected interconnect of one or both of the first and second semiconductor chip sections near bonding between the first and second semiconductor chip sections. The solid-state imaging device is a back-illuminated solid-state imaging device.

    SOLID-STATE IMAGING DEVICE, MANUFACTURING METHOD THEREOF, AND ELECTRONIC APPARATUS

    公开(公告)号:US20200219924A1

    公开(公告)日:2020-07-09

    申请号:US16824055

    申请日:2020-03-19

    Abstract: Disclosed herein is a solid-state imaging device including: a laminated semiconductor chip configured to be obtained by bonding two or more semiconductor chip sections to each other and be obtained by bonding at least a first semiconductor chip section in which a pixel array and a multilayer wiring layer are formed and a second semiconductor chip section in which a logic circuit and a multilayer wiring layer are formed to each other in such a manner that the multilayer wiring layers are opposed to each other and are electrically connected to each other; and a light blocking layer configured to be formed by an electrically-conductive film of the same layer as a layer of a connected interconnect of one or both of the first and second semiconductor chip sections near bonding between the first and second semiconductor chip sections. The solid-state imaging device is a back-illuminated solid-state imaging device.

Patent Agency Ranking