SOLID ELECTROLYTE COMPOSITION
    1.
    发明申请

    公开(公告)号:US20210408589A1

    公开(公告)日:2021-12-30

    申请号:US17291624

    申请日:2019-11-08

    IPC分类号: H01M10/0565 H01M10/0525

    摘要: The present invention relates to a solid electrolyte composition comprising: a) at least one (per)fuoropolyether comprising a (per)fluoropolyoxyalkylene chain [chain (Rpf)] having two chain ends, wherein at least one chain end has formula (I): —[CH(J)CH2O]na[CH2CH(J)O]na′—H  (I) wherein each J is independently H, aryl, straight or branched alkyl, and na and na′, equal to or different from each other, are zero or an integer from 1 to 50, with the proviso that na+na′ is from 1 to 50; b) a poly(alkylene oxide) comprising chains of formula (II): R1B—[OCHR1A(CH2)jCHR2A]n—OR2B  (II) wherein each of R1A and R2A is independently a hydrogen atom or a C1-C5 alkyl group, j is zero or an integer of 1 to 2, R1B and R2B is independently a hydrogen atom or a C1-C3 alkyl group, and n is an integer from 5 to 1000, and c) at least one lithium salt.

    DENSE FLUOROPOLYMER FILM
    7.
    发明申请
    DENSE FLUOROPOLYMER FILM 审中-公开
    DENSE氟聚合物膜

    公开(公告)号:US20150349309A1

    公开(公告)日:2015-12-03

    申请号:US14653413

    申请日:2013-12-17

    摘要: The present invention pertains to a process for the manufacture of a dense film, said process comprising, preferably consisting of the following steps: a) providing a solid composition [composition (C)] comprising, preferably consisting of: at least one vinylidene fluoride (VDF) fluoropolymer comprising one or more carboxylic acid functional end groups [polymer (F)], at least one poly(alkylene oxide) (PAO) of formula (I): HO—(CH2CH RAO)n—RB, wherein RA is a hydrogen atom or a C1-C5 alkyl group, RB is a hydrogen atom or a —CH3 alkyl group and n is an integer comprised between 2000 and 40000, preferably between 4000 and 35000, more preferably between 11500 and 30000, and optionally, at least one inorganic filler [filler (I)]; and b) processing said composition (C) in molten phase thereby providing a dense film having a thickness of from 5 μm to 30 μm. The present invention also pertains to the dense film provided by said process and to use of said dense film as dense separator in electrochemical devices.

    摘要翻译: 本发明涉及制造致密膜的方法,所述方法优选包括以下步骤:a)提供固体组合物[组合物(C)],其包含,优选包含:至少一种偏二氟乙烯( VDF)氟聚合物,其包含一个或多个羧酸官能端基[聚合物(F)],至少一种式(I)的聚氧化烯(PAO):HO-(CH 2 CH RAO)n-RB,其中RA为 氢原子或C1-C5烷基,RB为氢原子或-CH3烷基,n为整数,为2000〜40000,优选为4000〜35000,更优选为11500〜30000,任选至少为 一种无机填料[填料(I)]; 和b)在熔融相中处理所述组合物(C),从而提供厚度为5μm至30μm的致密膜。 本发明还涉及由所述方法提供的致密膜以及将所述致密膜用作电化学装置中的致密隔膜。