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公开(公告)号:US20230350438A1
公开(公告)日:2023-11-02
申请号:US17732553
申请日:2022-04-29
Applicant: SEMES Co., Ltd.
Inventor: Yong Jun Seo , Sang Hyun Son , Sang Min Ha , Hyeong Jun Cho , Dong Ok Ahn
CPC classification number: G05D23/1927 , G01K3/14 , H01L21/67248 , H01L21/67103
Abstract: A process measurement apparatus and method capable of increasing production by decreasing an operating time are provided. The process measurement method is performed by a computing device, and includes receiving a plurality of sensed values from a plurality of sensors disposed in a wafer-type temperature sensor, generating a first temperature value of a first heating zone based on the plurality of sensed values, and determining a first compensation value based on a first difference value corresponding to a difference between the first temperature value and a target value, wherein a first compensation ratio between the first difference value and the first compensation value when the first difference value is a first value is different from a second compensation ratio between the first difference value and the first compensation value when the first difference value is a second value.
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公开(公告)号:US11919303B2
公开(公告)日:2024-03-05
申请号:US17734080
申请日:2022-05-01
Applicant: SEMES CO., LTD.
Inventor: Sang Min Ha , Sang Hyun Son , Young Joo Seo , Hyeong Jun Cho , Jae Hong Kim
CPC classification number: B41J2/04581 , B41J2/04518 , B41J2/072 , B41J2/125
Abstract: Provided is a jetting driver that can be used for various types of heads with minimal changes. The jetting driver includes: an image board receiving raw image data and generating image data by transforming the raw image data into a form suitable for a type of heads used; and an interface board physically separated from the image board, receiving the image data, and transmitting the image data to the heads through a plurality of channels.
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公开(公告)号:US12123903B2
公开(公告)日:2024-10-22
申请号:US17837027
申请日:2022-06-10
Applicant: SEMES CO., LTD.
Inventor: Jun Ho Oh , Kwang Sup Kim , Jae Hong Kim , Kyung Hun Jang , Young Ho Park , Jong Min Lee , Yeon Chul Song , Sang Min Ha , Ji Hoon Yoo , Myeong Jun Lim
IPC: G01R29/24
CPC classification number: G01R29/24
Abstract: A static electricity visualization apparatus capable of visually identifying a measured level of static electricity is provided. The static electricity visualization apparatus comprises a photographing unit for generating a first photographed image obtained by photographing a measurement target at a first distance from the measurement target in a first mode, and generating a second photographed image obtained by photographing the measurement target at a second distance from the measurement target in a second mode, a static electricity sensor for measuring a static electricity level of the measurement target at the second distance from the measurement target, a processor for matching the second photographed image with the first photographed image, and an output unit for outputting a static electricity visualization image that visualizes a static electricity level measured by the static electricity sensor on the first photographed image, wherein the static electricity visualization image comprises a color corresponding to the static electricity level of the measurement target measured by the static electricity sensor at a position where the second photographed image matches on the first photographed image.
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公开(公告)号:US11756815B2
公开(公告)日:2023-09-12
申请号:US17083189
申请日:2020-10-28
Applicant: SEMES CO., LTD.
Inventor: Yong Jun Seo , Sang Hyun Son , Sang Min Ha , Dong Ok Ahn
IPC: H01L21/67 , H01L23/00 , H01L21/324 , G01P15/02 , G01C19/00 , H01L23/498
CPC classification number: H01L21/67248 , G01C19/00 , G01P15/02 , H01L21/324 , H01L21/67103 , H01L23/4985 , H01L23/562
Abstract: Disclosed is an apparatus for precisely monitoring warpage deformation of a substrate. The apparatus includes a sensing unit and a processor. The sensing unit is removably mounted on the substrate and detects information on the warpage deformation of the substrate during a treatment process performed on the substrate. The processor generates warpage state information on the basis of the warpage information detected by the sensing unit.
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