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公开(公告)号：US20230213876A1
公开(公告)日：2023-07-06
申请号：US18148127
申请日：2022-12-29
Applicant: SEMES CO., LTD.
Inventor： Hyo Won YANG , Hyun Yoon , Young Ho Park , Tae Hee Kim , In Ki Jung , Kwang Sup Kim
CPC classification number: G03F7/70683 , G03F7/2053 , G03F7/30 , G03F7/40 , G03F7/70025 , G03F7/7085 , G03F7/70825 , G03F1/72
Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a support unit configured to rotate and support a substrate; a liquid supply unit configured to supply a liquid to the substrate supported on the support unit; and an optical module for heating the substrate supported on the support unit, and wherein the support unit includes a teaching member having a grid displaying a reference point which matches a center of the support unit.
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公开(公告)号：US11495467B2
公开(公告)日：2022-11-08
申请号：US17115313
申请日：2020-12-08
Applicant: SEMES CO., LTD.
Inventor： Jung Suk Goh , Jae Seong Lee , Do Youn Lim , Kuk Saeng Kim , Young Dae Chung , Tae Shin Kim , Jee Young Lee , Won Geun Kim , Ji Hoon Jeong , Kwang Sup Kim , Pil Kyun Heo , Yoon Ki Sa , Ye Rim Yeon , Hyun Yoon , Do Yeon Kim , Yong Jun Seo , Byeong Geun Kim , Young Je Um
IPC: H01L21/26 , H01L21/311 , H01L21/67 , H01L21/66
Abstract: Method and apparatus for etching a thin layer including silicon nitride formed on a substrate are disclosed. Etchant including phosphoric acid and water is supplied on the substrate so that a liquid layer is formed on the substrate. The thin layer is etched by reaction between the thin layer and the etchant. Thickness of the liquid layer is measured to detect variation in the thickness of the liquid layer while etching the thin layer. Variation in the concentration of the phosphoric acid and the water is calculated based on the variation in the thickness of the liquid layer. Water is supplied on the substrate based on the variation in the concentration of the phosphoric acid and the water so that the concentration of the phosphoric acid and the water becomes a predetermined value.
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公开(公告)号：US12138913B2
公开(公告)日：2024-11-12
申请号：US17876545
申请日：2022-07-29
Applicant: SEMES CO., LTD.
Inventor： Yeon Chul Song , Myeong Jun Lim , Kwang Sup Kim , Jong Min Lee , Jun Ho Oh , Ji Hoon Yoo , Young Ho Park
Abstract: Provided are a control unit that predicts the life of an inkjet head unit and maximizes its life to be used, and a substrate treating apparatus including the same. The control unit performs maintenance of an inkjet head unit for discharging a substrate treatment liquid onto a substrate and comprises a count module for counting the number of discharges for each nozzle of the inkjet head unit, a comparison module for comparing the number of discharges with a reference value to determine whether the number of discharges is equal to or greater than the reference value, and an evaluation module for evaluating whether a life of the inkjet head unit has reached a usable life based on whether the number of discharges of each nozzle is equal to or greater than the reference value.
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Patent Agency Ranking
公开(公告)号：US20240160486A1
公开(公告)日：2024-05-16
申请号：US18380656
申请日：2023-10-17
Applicant: SEMES CO., LTD.
Inventor： Sang Hyun SON , Yeon Chul Song , Myeong Jun Lim , Ji Hoon Yoo , Kwang Sup Kim , Jong Min Lee , Young Ho Park , Jun Ho Oh , Joong Chol Shin , Hyun Cheol Cho
IPC: G06F9/50
CPC classification number: G06F9/5038 , G06F9/5072 , G06F2209/503 , G06F2209/505
Abstract: A computing resource management system using software modularization in a cluster computing environment in which computing devices are connected, including an application process running on each computing device and an algorithm processing process configured to run independently of the application process and perform task processing on the application process, the computing resource management system including: a task managing system configured to receive a task request message from an application process requiring a task from each computing device; a process managing system configured to confirm an algorithm processing process of computing devices connected to the cluster computing environment, and determine whether there is an algorithm processing process in an idle state to which the application process requested for a task will be assigned; and a performed managing system configured to confirm a result of an application process whose task is performed by the algorithm processing process.
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公开(公告)号：US11577506B2
公开(公告)日：2023-02-14
申请号：US17467266
申请日：2021-09-05
Applicant: SEMES CO., LTD.
Inventor： Kwang Sup Kim , Dong Ok Ahn , Jong Min Lee , Jun Ho Oh , Ji Hoon Yoo , Young Ho Park
Abstract: Disclosed are an apparatus and a method for quickly and accurately inspecting a droplet on a substrate. An apparatus for inspecting a droplet on a substrate according to an exemplary embodiment of the present disclosure includes: an ultrasonic sensor configured to apply an ultrasonic wave to a droplet on the substrate and detect an ultrasonic wave reflected from the substrate; and a processor configured to acquire a height of the droplet at each position on the substrate on the basis of a signal of the ultrasonic wave reflected from the droplet on the substrate, calculate a volume of the droplet on the basis of the heights of the droplet at the positions, and store or output data in relation to the volume of the droplet. The embodiment of the present disclosure may calculate the volume of the droplet using the ultrasonic wave, thereby quickly and accurately inspecting the droplet on the substrate.
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公开(公告)号：US12123903B2
公开(公告)日：2024-10-22
申请号：US17837027
申请日：2022-06-10
Applicant: SEMES CO., LTD.
Inventor： Jun Ho Oh , Kwang Sup Kim , Jae Hong Kim , Kyung Hun Jang , Young Ho Park , Jong Min Lee , Yeon Chul Song , Sang Min Ha , Ji Hoon Yoo , Myeong Jun Lim
IPC: G01R29/24
CPC classification number: G01R29/24
Abstract: A static electricity visualization apparatus capable of visually identifying a measured level of static electricity is provided. The static electricity visualization apparatus comprises a photographing unit for generating a first photographed image obtained by photographing a measurement target at a first distance from the measurement target in a first mode, and generating a second photographed image obtained by photographing the measurement target at a second distance from the measurement target in a second mode, a static electricity sensor for measuring a static electricity level of the measurement target at the second distance from the measurement target, a processor for matching the second photographed image with the first photographed image, and an output unit for outputting a static electricity visualization image that visualizes a static electricity level measured by the static electricity sensor on the first photographed image, wherein the static electricity visualization image comprises a color corresponding to the static electricity level of the measurement target measured by the static electricity sensor at a position where the second photographed image matches on the first photographed image.
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7.发明公开公开(公告)号：US20240139934A1
公开(公告)日：2024-05-02
申请号：US18180410
申请日：2023-03-08
Applicant: SEMES CO., LTD.
Inventor： Jong Min Lee , Kwang Sup Kim , Myeong Jun Lim , Young Ho Park , Yeon Chul Song , Sang Hyun Son , Jun Ho Oh , Ji Hoon Yoo , Joong Chol Shin
CPC classification number: B25J9/0081 , B25J9/1697 , B25J11/0095 , B25J19/021
Abstract: The inventive concept provides a teaching method for teaching a transfer position of a transfer robot. The teaching method includes: searching for an object on which a target object to be transferred by the transfer robot is placed, based on a 3D position information acquired by a first sensor; and acquiring coordinates of a second direction and coordinates of a third direction of the object based on a data acquired from a second sensor which is a different type from the first sensor.
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公开(公告)号：US20230101546A1
公开(公告)日：2023-03-30
申请号：US17876545
申请日：2022-07-29
Applicant: SEMES CO., LTD.
Inventor： Yeon Chul SONG , Myeong Jun Lim , Kwang Sup Kim , Jong Min Lee , Jun Ho Oh , Ji Hoon Yoo , Young Ho Park
Abstract: Provided are a control unit that predicts the life of an inkjet head unit and maximizes its life to be used, and a substrate treating apparatus including the same. The control unit performs maintenance of an inkjet head unit for discharging a substrate treatment liquid onto a substrate and comprises a count module for counting the number of discharges for each nozzle of the inkjet head unit, a comparison module for comparing the number of discharges with a reference value to determine whether the number of discharges is equal to or greater than the reference value, and an evaluation module for evaluating whether a life of the inkjet head unit has reached a usable life based on whether the number of discharges of each nozzle is equal to or greater than the reference value.
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