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公开(公告)号:US10450266B2
公开(公告)日:2019-10-22
申请号:US15519308
申请日:2015-10-13
申请人: SAN-APRO LIMITED
发明人: Masaaki Oka , Yuji Nakamura
IPC分类号: C07C309/65 , C07C309/64 , C09K3/00 , G03F7/004 , G03F7/038 , C07C309/73 , C07D311/12 , C08G59/68
摘要: Provided are: a non-ionic photoacid generator containing a sulfonate compound having a high photosensitivity to i lines, exhibiting excellent heat-resistance stability, and exhibiting excellent solubility in a hydrophobic material; and a resin composition for photolithography containing the same. The present invention is a sulfonate compound characterized by being represented by general formula (1).[In formula (1), R1 represents an aryl group having 6 to 18 carbon atoms or a heterocyclic hydrocarbon group having 4 to 20 carbon atoms. R2 represents a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, an alkynyl group having 2 to 18 carbon atoms, or an aryl group having 6 to 18 carbon atoms. R3 represents a hydrocarbon group having 1 to 18 carbon atoms (in which some or all hydrogen atoms may be substituted with fluorine).]
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公开(公告)号:US20170233336A1
公开(公告)日:2017-08-17
申请号:US15519308
申请日:2015-10-13
申请人: SAN-APRO LIMITED
发明人: Masaaki Oka , Yuji Nakamura
IPC分类号: C07C309/65 , G03F7/004 , C07D311/12 , C07C309/73
CPC分类号: C07C309/65 , C07C309/64 , C07C309/73 , C07D311/12 , C08G59/68 , C09K3/00 , G03F7/004 , G03F7/0045 , G03F7/038
摘要: Provided are: a non-ionic photoacid generator containing a sulfonate compound having a high photosensitivity to i lines, exhibiting excellent heat-resistance stability, and exhibiting excellent solubility in a hydrophobic material; and a resin composition for photolithography containing the same. The present invention is a sulfonate compound characterized by being represented by general formula (1).[In formula (1), R1 represents an aryl group having 6 to 18 carbon atoms or a heterocyclic hydrocarbon group having 4 to 20 carbon atoms. R2 represents a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, an alkynyl group having 2 to 18 carbon atoms, or an aryl group having 6 to 18 carbon atoms. R3 represents a hydrocarbon group having 1 to 18 carbon atoms (in which some or all hydrogen atoms may be substituted with fluorine).]
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