专利检索 ap:("SAMSUNG SDI CO., LTD.") AND inv:"Sukil KANG" 第 1 页

1.

发明公开
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION 审中-公开

公开(公告)号：US20240345477A1

公开(公告)日：2024-10-17

申请号：US18587235

申请日：2024-02-26

申请人： SAMSUNG SDI CO., LTD.

发明人： Dong Wan RYU , Young Keun KIM , Seol Hee LIM , Soobin LIM , Sukil KANG

IPC分类号： G03F7/004 , G03F7/027 , G03F7/20

CPC分类号： G03F7/0042 , G03F7/0048 , G03F7/027 , G03F7/2006

摘要： Disclosed are a semiconductor photoresist composition including an organometallic compound represented by Chemical Formula 1, and a solvent, a method of forming patterns using the same.

2.

发明公开
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION 审中-公开

公开(公告)号：US20240241437A1

公开(公告)日：2024-07-18

申请号：US18473132

申请日：2023-09-22

申请人： SAMSUNG SDI CO., LTD.

发明人： Seol Hee LIM , Changsoo WOO , Young Keun KIM , Dong Wan RYU , Soobin LIM , Sukil KANG , Eunmi KANG

IPC分类号： G03F7/004 , C07F7/22

CPC分类号： G03F7/0042 , C07F7/2284

摘要： A semiconductor photoresist composition and a method of forming patterns using the semiconductor photoresist composition are disclosed. The semiconductor photoresist composition may include an organotin compound represented by Chemical Formula 1 and a solvent.