- 专利标题： SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
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申请号： US18473132申请日： 2023-09-22
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公开(公告)号： US20240241437A1公开(公告)日： 2024-07-18
- 发明人: Seol Hee LIM , Changsoo WOO , Young Keun KIM , Dong Wan RYU , Soobin LIM , Sukil KANG , Eunmi KANG
- 申请人： SAMSUNG SDI CO., LTD.
- 申请人地址： KR Yongin-si
- 专利权人： SAMSUNG SDI CO., LTD.
- 当前专利权人： SAMSUNG SDI CO., LTD.
- 当前专利权人地址： KR Yongin-si
- 优先权： KR 20230001356 2023.01.04
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; C07F7/22
摘要：
A semiconductor photoresist composition and a method of forming patterns using the semiconductor photoresist composition are disclosed. The semiconductor photoresist composition may include an organotin compound represented by Chemical Formula 1 and a solvent.
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