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公开(公告)号：US20230288809A1
公开(公告)日：2023-09-14
申请号：US18006135
申请日：2021-11-11
发明人： Yoojeong CHOI , Soonhyung KWON , Minsoo KIM , Seongjin KIM , Jaeyeol BAEK , Hwayoung JIN , Hyeon PARK , Shinhyo BAE , Daeseok SONG , Minki CHON
IPC分类号： G03F7/11 , C08G75/045 , C08F26/06 , G03F7/38
CPC分类号： G03F7/11 , C08G75/045 , C08F26/06 , G03F7/38
摘要： Provided are a resist underlayer composition including a polymer having a ring backbone including two or more nitrogen atoms in a ring, a compound represented by Chemical Formula 1, and a solvent; and a method of forming patterns using the resist underlayer composition:
The definitions of Chemical Formula 1 are as described in the detailed description.-
公开(公告)号：US20230103089A1
公开(公告)日：2023-03-30
申请号：US17868563
申请日：2022-07-19
发明人： Yoojeong CHOI , Soonhyung KWON , Minsoo KIM , Seongjin KIM , Jaeyeol BAEK , Hwayoung JIN , Ran NAMGUNG , Hyeon PARK , Daeseok SONG
IPC分类号： G03F7/11 , C07D251/32 , C07D405/06 , C07D209/86 , C07D209/62 , C07D333/54 , C07D339/08 , C07C39/23 , C08K5/378 , C08K5/3417 , C08K5/45
摘要： A resist underlayer composition including a polymer including a main chain, a side chain, or a main chain and a side chain including a heterocycle including two or more nitrogen atoms in the ring of the heterocycle, a compound including a moiety represented by Chemical Formula 1, and a solvent is provided. A method of forming patterns using the resist underlayer composition is also provided
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公开(公告)号：US20240061338A1
公开(公告)日：2024-02-22
申请号：US18213185
申请日：2023-06-22
发明人： Yoojeong CHOI , Seongjin KIM , Jaeyeol BAEK , Hwayoung JIN , Soonhyung KWON
CPC分类号： G03F7/11 , G03F7/2016
摘要： A resist underlayer composition and a method of forming patterns using the resist underlayer composition are provided. The resist underlayer composition may include a polymer including a structural unit represented by Chemical Formula 1, a structural unit represented by Chemical Formula 2, or a combination thereof; a compound represented by Chemical Formula 3; and a solvent.
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