公开(公告)号：US11009790B2

公开(公告)日：2021-05-18

申请号：US15662677

申请日：2017-07-28

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Suk-koo Hong ,  Kyoung-yong Cho ,  Hyo-sung Lee ,  Gum-hye Jeon ,  Mi-yeong Kang ,  Gun-woo Park

IPC分类号： G03F7/004 ,  G03F7/26 ,  C07C309/05 ,  C07C309/06 ,  C07C309/19 ,  C07C309/32 ,  C07C309/39 ,  C07C309/65 ,  C07C309/73 ,  C07C303/32 ,  G03F7/027 ,  G03F7/038 ,  G03F7/11 ,  G03F7/20 ,  G03F7/039 ,  C07C309/12 ,  C07C309/17 ,  C07C381/12 ,  C07D333/46

摘要： A photoacid generator (PAG) and a photoresist composition, the PAG being represented by the following Chemical Formula (I): wherein, in Chemical Formula (I), L is sulfur (S) or iodine (I), R3 being omitted when L is I; R1, R2, and R3 are each independently a C1 to C10 alkyl, alkenyl, alkynyl, or alkoxy group that is unsubstituted or substituted with a heteroatom such that the heteroatom is pendant or is between the group and L, or a C6 to C18 aryl, arylalkyl, or alkylaryl group that is unsubstituted or substituted with a heteroatom such that the heteroatom is pendant or is between the group and L; AL is an acid-labile group; m is 1 to 4; and M is a C1 to C30 hydrocarbon group that is unsubstituted or substituted with a heteroatom such that the heteroatom is pendant or is between the group and a sulfur atom.