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公开(公告)号:US20200182777A1
公开(公告)日:2020-06-11
申请号:US16532662
申请日:2019-08-06
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jang Ik PARK , Kwang Rak KIM , Yoon Sung BAE , Young Hoon SOHN , Yu Sin YANG , Tae Yong JO
Abstract: A substrate inspection apparatus includes a light irradiating unit irradiating first light to an inspection target on a stage, a light detecting unit detecting second light reflected by the inspection target, a spectrum generator generating a first spectrum from the second light, a noise filter module removing a noise signal from the first spectrum to generate a second spectrum, a spectrum analyzer determining a first calibration parameter and a first calibration value thereof from the second spectrum, and a hardware controller adjusting at least one of the stage, the light irradiating unit and the light detecting unit using the first calibration parameter and the first calibration value.
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2.
公开(公告)号:US20230028347A1
公开(公告)日:2023-01-26
申请号:US17684052
申请日:2022-03-01
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jang Ryul PARK , Soon Yang KWON , Kwang Rak KIM , Myung Jun LEE , Sung Ho JANG
Abstract: A method for fabricating a semiconductor device is provided. The method includes: loading a substrate on a stage of an apparatus for inspecting the substrate; extracting a first light having a first wavelength from a light by using a light source; acquiring first position information on at least one focal point, formed on the substrate, based on the first wavelength by using a controller, the at least one focal point being a pre-calculated at least one focal point; adjusting a position of at least one from among an objective lens and at least one microsphere in a vertical direction by using the first position information in the controller; condensing the first light, which has passed through the at least one microsphere, on the at least one focal point formed on the substrate; and inspecting the substrate by using the first light condensed on the at least one focal point.
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