公开(公告)号：US20240120378A1

公开(公告)日：2024-04-11

申请号：US18453529

申请日：2023-08-22

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sunme Lim ,  Joongwon Jeon

IPC: H01L29/06 ,  H01L29/423 ,  H01L29/66 ,  H01L29/775

CPC classification number: H01L29/0692 ,  H01L29/0673 ,  H01L29/42392 ,  H01L29/66439 ,  H01L29/66545 ,  H01L29/775

Abstract: A semiconductor device may include a substrate including a first and a second row region, wherein a surface of the substrate is disposed in a first direction and a second direction perpendicular to the first direction, a first nanosheet structure on the first row region and including active segments disposed in the first direction, and the active segments having different widths in the second direction; and a second nanosheet structure on the second row region, the second nanosheet structure spaced apart from the first nanosheet structure in the second direction, and wherein the second nanosheet structure is symmetrical to the first nanosheet structure in the first direction. In a plan view, in each of the first and second nanosheet structures, transition regions between adjacent ones of the active segments have one of a same first angle and a second angle with respect to the first direction.

公开(公告)号：US20240055427A1

公开(公告)日：2024-02-15

申请号：US18143187

申请日：2023-05-04

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jin KIM ,  Namjae Kim ,  Subin Kim ,  Byungmoo Kim ,  Joongwon Jeon

IPC: H01L27/088 ,  H01L21/8234 ,  H01L23/528

CPC classification number: H01L27/0886 ,  H01L21/823475 ,  H01L23/528 ,  H01L21/823493 ,  H01L2029/7858

Abstract: A semiconductor device including: a substrate including a PMOS region, an N-well tap forming region, and a boundary region; PMOS field effect transistors on the PMOS region; an N-well tap region doped with N-type impurities in the N-well tap forming region; a first metal pattern connected to at least one impurity region of the PMOS field effect transistors, wherein the first metal pattern extends so that an end of the first metal pattern is positioned on the boundary region; a second metal pattern electrically connected to the N-well tap region, wherein the second metal pattern extends so that an end of the second metal pattern is positioned on the boundary region; a first contact plug on the first metal pattern; a second contact plug on the second metal pattern; and an upper wiring on the first and second contact plugs.