SEMICONDUCTOR DEVICE INCLUDING LINE PATTERNS
    1.
    发明申请
    SEMICONDUCTOR DEVICE INCLUDING LINE PATTERNS 审中-公开
    包括线图案的半导体器件

    公开(公告)号:US20160307844A1

    公开(公告)日:2016-10-20

    申请号:US15009921

    申请日:2016-01-29

    Abstract: Provided is a semiconductor device. The device includes a plurality of line patterns, which extend in a first direction and are arranged a first space apart from one another in a second direction perpendicular to the first direction. The line patterns include a line pattern set including two sub-line patterns that are arranged the first space apart from each other in the second direction and have a first width of a minimum feature size (1F) in the second direction, and a wide-width line pattern that is arranged the first space apart from one side of the line pattern set in the second direction and has a second width larger than the first width in the second direction.

    Abstract translation: 提供一种半导体器件。 该装置包括多个线图案,其沿第一方向延伸并且在垂直于第一方向的第二方向上彼此分开布置第一空间。 线图案包括线图案组,其包括在第二方向上彼此分开布置第一空间并且具有第二方向上的最小特征尺寸(1F)的第一宽度的两个子线图案, 宽度线图案,其布置成沿着在第二方向设置的线条图案的一侧分开的第一空间,并且具有比第二方向上的第一宽度大的第二宽度。

Patent Agency Ranking