SEMICONDUCTOR DEVICES
    1.
    发明公开

    公开(公告)号:US20230307451A1

    公开(公告)日:2023-09-28

    申请号:US18326522

    申请日:2023-05-31

    Abstract: A semiconductor device includes a substrate including a boundary region between first and second regions, first active patterns on the first region, second active patterns on the second region, and an isolation insulating pattern on the boundary region between the first and second active patterns. A width of at least some of the first active patterns have different widths. Widths of the second active patterns may be equal to each other. A bottom surface of the isolation insulating pattern includes a first bottom surface adjacent to a corresponding first active pattern, a second bottom surface adjacent to a corresponding second active pattern, and a third bottom surface between the first bottom surface and the second bottom surface. The third bottom surface is located at a different height from those of the first and second bottom surfaces with respect to a bottom surface of the substrate.

    SCROLL COMPRESSOR
    2.
    发明申请

    公开(公告)号:US20250101976A1

    公开(公告)日:2025-03-27

    申请号:US18886199

    申请日:2024-09-16

    Abstract: A scroll compressor can include a frame including a shaft hole, a fixed scroll on an upper side of the frame, an orbiting scroll between the fixed scroll and the frame, a lower surface of the orbiting scroll including a boss inserted into the shaft hole, a rotatable shaft including an eccentric portion inserted into the boss and inserted into the shaft hole, a first bearing in the shaft hole between the shaft hole and a bearing support coupled to an outer circumferential surface of the rotating shaft, an inner circumferential surface of the first bearing being supported by an outer circumferential surface of the bearing support, the bearing support being separatable from, and couplable to, the rotating shaft, and a second bearing between the boss and the eccentric portion so that a location of the second bearing overlaps the first bearing in an axial direction of the rotatable shaft.

    SEMICONDUCTOR DEVICES
    3.
    发明申请

    公开(公告)号:US20220199616A1

    公开(公告)日:2022-06-23

    申请号:US17394991

    申请日:2021-08-05

    Abstract: A semiconductor device includes a substrate including a boundary region between first and second regions, first active patterns on the first region, second active patterns on the second region, and an isolation insulating pattern on the boundary region between the first and second active patterns. A width of at least some of the first active patterns have different widths. Widths of the second active patterns may be equal to each other. A bottom surface of the isolation insulating pattern includes a first bottom surface adjacent to a corresponding first active pattern, a second bottom surface adjacent to a corresponding second active pattern, and a third bottom surface between the first bottom surface and the second bottom surface. The third bottom surface is located at a different height from those of the first and second bottom surfaces with respect to a bottom surface of the substrate.

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