公开(公告)号：US20250087464A1

公开(公告)日：2025-03-13

申请号：US18590406

申请日：2024-02-28

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jaehyun SOH ,  Wookhyeon KWON ,  Chulwoo PARK ,  Dongkyu SHIN ,  Hoontaek LEE ,  Minnhoo CHOI ,  Yongwoo KIM ,  Jaehyun KIM ,  Hansol KIM ,  Deukho LEE ,  Junghyun CHO ,  Yangyeon CHU ,  Uzun KAAN

IPC: H01J37/32

Abstract: An embodiment provides a focus ring alignment apparatus including a frame, a sensing member that is connected to the frame and is configured to acquire images of a focus ring within in a substrate processing apparatus, and an alignment module that is connected to the frame and is configured to move the focus ring to change a position of the focus ring.

公开(公告)号：US20210110997A1

公开(公告)日：2021-04-15

申请号：US16850252

申请日：2020-04-16

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Dongkyu SHIN ,  Sangki NAM ,  Soonam PARK ,  Akira KOSHIISHI ,  Kyuhee HAN

IPC: H01J37/32 ,  H01J37/063 ,  H01L21/67 ,  H01L21/683 ,  H01L21/3065

Abstract: An electron beam generator, a plasma processing apparatus, and a plasma processing method, the electron beam generator including a side insulator configured to surround the substrate support, the side insulator having an electron beam chamber therein; a first electrode embedded in the side insulator and adjacent to a first side wall of the electron beam chamber; a second electrode on a second side wall of the electron beam chamber; and a guide in an outlet of the electron beam chamber, the guide including slits through which electron beams generated in the electron beam chamber are transmittable into the process chamber.