公开(公告)号：US20250004370A1

公开(公告)日：2025-01-02

申请号：US18392365

申请日：2023-12-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Beomseok KIM ,  Minsang KIM ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Chanjae AHN ,  Changheon LEE ,  Kyuhyun IM ,  Sungwon CHOI

IPC: G03F7/038 ,  C08F12/22 ,  G03F7/004 ,  G03F7/20

Abstract: Provided are a polymer including a first repeating unit represented by Formula 1, a resist composition including the polymer, and a method of forming a pattern using the resist composition: wherein descriptions of L11 to L14, a11 to a13, A11, X11, R11, R12, b12 and p in Formula 1 are provided in the present specification.

公开(公告)号：US20240234492A1

公开(公告)日：2024-07-11

申请号：US18407040

申请日：2024-01-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Haeryong KIM ,  Jinho LEE ,  Donghyun KIM ,  Beomseok KIM ,  Cheheung KIM ,  Jooho LEE

IPC: H01L29/06 ,  H01L27/06 ,  H01L29/423 ,  H10B12/00

CPC classification number: H01L29/0607 ,  H01L27/0629 ,  H01L28/65 ,  H01L28/75 ,  H01L29/4236 ,  H10B12/30

Abstract: Provided are a capacitor and an electronic device including the same. The capacitor includes a first electrode layer, a second electrode layer, a dielectric layer disposed between the first electrode layer and the second electrode layer, and an interlayer disposed between the first electrode layer and the dielectric layer. The interlayer includes a first interface material, the first interface material includes at least one Group 13 element, and the at least one Group 13 element is not aluminum (Al).

公开(公告)号：US20240233092A1

公开(公告)日：2024-07-11

申请号：US18616953

申请日：2024-03-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Gyehyun KIM ,  Beomseok KIM ,  Youjin LEE ,  Taeyoung JANG ,  Youngo PARK ,  Yongsup PARK ,  Sangmi LEE ,  Kwangpyo CHOI

IPC: G06T5/60 ,  G06T5/50

CPC classification number: G06T5/60 ,  G06T5/50 ,  G06T2207/20016 ,  G06T2207/20084 ,  G06T2207/20216

Abstract: Provided are an image processing method and an input processing device based on a neural network, the method including: obtaining a feature map distinguishing between a near object and a distant object of a low-resolution input image, obtaining a composited weight map for the low-resolution input image by inputting the feature map to a first Deep Neural Network (DNN), obtaining a first image by inputting the low-resolution input image to a second DNN suitable for restoring a distant object, obtaining a second image by inputting the low-resolution input image to a third DNN suitable for restoring a near object, and obtaining a high-resolution image for the low-resolution input image by performing weighted averaging on the first image and the second image using the composited weight map.

公开(公告)号：US20250006778A1

公开(公告)日：2025-01-02

申请号：US18510973

申请日：2023-11-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Haeryong KIM ,  Eunae CHO ,  Beomseok KIM ,  Jeeeun YANG ,  Jooho LEE

IPC: H01G4/08 ,  H01G4/008 ,  H10B12/00

Abstract: A capacitor includes a first electrode, a second electrode spaced apart from the first electrode, a dielectric layer arranged between the first electrode and the second electrode, and an interface layer arranged between the second electrode and the dielectric layer, wherein the interface layer includes a first element, a second element, and a third element, the first element includes aluminum (Al), the second element includes gallium (Ga), and the third element includes oxygen (O).

公开(公告)号：US20230410446A1

公开(公告)日：2023-12-21

申请号：US18456823

申请日：2023-08-28

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Gyehyun KIM ,  Yoonhee CHOI ,  Keunjoo KWON ,  Beomseok KIM ,  Sangwon LEE ,  Youjin LEE ,  Taeyoung JANG

IPC: G06T19/00 ,  G06T11/00 ,  G06T7/50 ,  G06T11/60 ,  G06F18/00 ,  G06V10/82 ,  G06V10/26

CPC classification number: G06T19/006 ,  G06T11/001 ,  G06T7/50 ,  G06T11/60 ,  G06T2207/20212 ,  G06V10/82 ,  G06V10/26 ,  G06T2207/30192 ,  G06F18/00

Abstract: A system and method for providing a weather effect in an image includes selecting at least one weather texture image indicating weather, and providing a weather effect in the image by overlapping the selected weather texture image on the image.

公开(公告)号：US20250021003A1

公开(公告)日：2025-01-16

申请号：US18537601

申请日：2023-12-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： Cheol KANG ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Minsang KIM ,  Beomseok KIM ,  Hana KIM ,  Hoyoon PARK ,  Chanjae AHN ,  Jaejun LEE ,  Sungwon CHOI

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038

Abstract: Provided are a polymer including a first repeating unit represented by Formula 1 below, a resist composition including the same, a method of forming a pattern by using the same, and a monomer represented by Formula 10 below. In Formulae 1 and 10, L11 to L13, a11 to a13, X11, Rf, and R11 to R13 are as described in the specification.

公开(公告)号：US20240255847A1

公开(公告)日：2024-08-01

申请号：US18404865

申请日：2024-01-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hana KIM ,  Yoonhyun KWAK ,  Hyeran KIM ,  Beomseok KIM ,  Hoyoon PARK ,  Sunyoung LEE ,  Minyoung HA

IPC: G03F7/004 ,  G03F7/039

CPC classification number: G03F7/0045 ,  G03F7/0048 ,  G03F7/039

Abstract: Provided are an organic salt represented by Formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition:






For descriptions of L1, n1, R1, and A+ in Formula 1, refer to those provided herein.

公开(公告)号：US20240201588A1

公开(公告)日：2024-06-20

申请号：US18192316

申请日：2023-03-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hana KIM ,  Beomseok KIM ,  Kyuhyun IM ,  Yoonhyun KWAK ,  Hyeran KIM

IPC: G03F7/004 ,  C07C65/10 ,  C07C309/12 ,  C07C311/09 ,  C07C391/02 ,  C07C395/00 ,  G03F7/038 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C65/10 ,  C07C309/12 ,  C07C311/09 ,  C07C391/02 ,  C07C395/00 ,  G03F7/0382 ,  G03F7/0397 ,  C07C2603/74

Abstract: Provided are an organic salt represented by Formula 1, a photoresist composition including the same, and a pattern method using the same:




wherein X+, Y−, and R11 to R13 in Formula 1 are understood by referring to the specification.

公开(公告)号：US20240429043A1

公开(公告)日：2024-12-26

申请号：US18504712

申请日：2023-11-08

Applicant: Samsung Electronics Co., Ltd. ,  AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION

Inventor： Jeonggyu SONG ,  Ilkwon OH ,  Beomseok KIM ,  Jooho LEE ,  Wonsik CHOI ,  Byungjun WON ,  Minjeong RHEE

IPC: H01L21/02 ,  C23C16/34 ,  C23C16/40 ,  C23C16/455

Abstract: Provided is a method of forming an insulating film on a substrate by using atomic layer deposition (ALD). The method of forming an insulating film on a substrate by using ALD includes transferring a deposition-hindering material to the substrate, and depositing a first material layer by transferring a first precursor to the deposition-hindering material, wherein the deposition-hindering material includes an organic ligand, and the first precursor includes an alkoxide ligand.

公开(公告)号：US20240327338A1

公开(公告)日：2024-10-03

申请号：US18483895

申请日：2023-10-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Aram JEON ,  Hana KIM ,  Beomseok KIM ,  Hoyoon PARK ,  Kyuhyun IM ,  Jinwon JEON ,  Sungwon CHOI

IPC: C07C309/58 ,  C07C309/42 ,  G03F7/004 ,  G03F7/029 ,  G03F7/20

CPC classification number: C07C309/58 ,  C07C309/42 ,  G03F7/0045 ,  G03F7/0048 ,  G03F7/029 ,  G03F7/2004

Abstract: Provided are an organic salt represented by Formula 1, a resist composition including the same, and a method of forming a pattern by using the same:


A11+B11−  Formula 1



wherein, in Formula 1,
A11+ is represented by Formula 1A, and B11− is represented by Formula 1B,










wherein descriptions of R11 to R13, L21, L22, a21, a22, R21, R22, Rf, b22, c11 and n11 in Formulae 1A and 1B are provided herein.