公开(公告)号：US20140045343A1

公开(公告)日：2014-02-13

申请号：US14054536

申请日：2013-10-15

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Yong-Sup Choi ,  Kang-Il Lee ,  Chang Mog Jo

IPC: H01L21/02

CPC classification number: H01L21/02107 ,  C23C14/04 ,  C23C14/044 ,  C23C14/12 ,  C23C14/24 ,  C23C14/243 ,  C23C14/564 ,  C23C16/04 ,  C23C16/042 ,  C23C16/448 ,  C23C16/4485 ,  C23C16/45563

Abstract: A thin film deposition apparatus can be simply applied to produce large-sized display devices on a mass scale and improves manufacturing yield. The thin film deposition apparatus for forming a thin film on a substrate includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in the first direction; wherein each of the patterning slits includes a plurality of sub-slits.

Abstract translation: 薄膜沉积装置可以简单地应用于大规模生产大尺寸显示装置并提高制造成品率。 用于在基板上形成薄膜的薄膜沉积装置包括：放电沉积材料的沉积源; 沉积源喷嘴单元，设置在沉积源的一侧，并且包括沿第一方向布置的多个沉积源喷嘴; 以及图案化缝隙片，与所述沉积源喷嘴单元相对设置并且包括沿所述第一方向布置的多个图案化狭缝; 其中每个图案化缝隙包括多个子狭缝。

公开(公告)号：US10287671B2

公开(公告)日：2019-05-14

申请号：US15145689

申请日：2016-05-03

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hyun-Sook Park ,  Chang-Mog Jo ,  Hee-Cheol Kang ,  Yun-Mi Lee ,  Un-Cheol Sung ,  Yong-Sup Choi ,  Jong-Heon Kim ,  Jae-Kwang Ryu

IPC: C23C14/04 ,  C23C14/24 ,  H01L51/00

Abstract: A thin film deposition apparatus that can be simply applied to produce large-sized display devices on a mass scale and that improves manufacturing yield. The thin film deposition apparatus includes a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in a second direction that is perpendicular to the first direction. A deposition is performed while the substrate or the thin film deposition apparatus moves relative to each other in the first direction, and the deposition source, the deposition source nozzle unit, and the patterning slit sheet are formed integrally with each other.

公开(公告)号：US20160244872A1

公开(公告)日：2016-08-25

申请号：US15145689

申请日：2016-05-03

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hyun-Sook Park ,  Chang-Mog Jo ,  Hee-Cheol Kang ,  Yun-Mi Lee ,  Un-Cheol Sung ,  Yong-Sup Choi ,  Jong-Heon Kim ,  Jae-Kwang Ryu

IPC: C23C14/24 ,  C23C14/04

CPC classification number: C23C14/24 ,  C23C14/042 ,  H01L51/001

Abstract: A thin film deposition apparatus that can be simply applied to produce large-sized display devices on a mass scale and that improves manufacturing yield. The thin film deposition apparatus includes a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in a second direction that is perpendicular to the first direction. A deposition is performed while the substrate or the thin film deposition apparatus moves relative to each other in the first direction, and the deposition source, the deposition source nozzle unit, and the patterning slit sheet are formed integrally with each other.

Abstract translation: 一种薄膜沉积装置，其可以简单地应用于大规模生产大尺寸显示装置并且提高制造产量。 薄膜沉积装置包括：放电沉积材料的沉积源; 沉积源喷嘴单元，设置在沉积源的一侧，并且包括沿第一方向布置的多个沉积源喷嘴; 以及与沉积源喷嘴单元相对设置并包括沿垂直于第一方向的第二方向布置的多个图案化狭缝的图案化缝隙片。 当基板或薄膜沉积装置在第一方向上相对移动时进行沉积，并且沉积源，沉积源喷嘴单元和图案化缝隙片彼此一体地形成。

公开(公告)号：US20190226078A1

公开(公告)日：2019-07-25

申请号：US16368748

申请日：2019-03-28

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hyun-Sook Park ,  Chang-Mog Jo ,  Hee-Cheol Kang ,  Yun-Mi Lee ,  Un-Cheol Sung ,  Yong-Sup Choi ,  Jong-Heon Kim ,  Jae-Kwang Ryu

IPC: C23C14/24 ,  C23C14/04

Abstract: A thin film deposition apparatus that can be simply applied to produce large-sized display devices on a mass scale and that improves manufacturing yield. The thin film deposition apparatus includes a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in a second direction that is perpendicular to the first direction. A deposition is performed while the substrate or the thin film deposition apparatus moves relative to each other in the first direction, and the deposition source, the deposition source nozzle unit, and the patterning slit sheet are formed integrally with each other.

公开(公告)号：US09224591B2

公开(公告)日：2015-12-29

申请号：US14054536

申请日：2013-10-15

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Yong-Sup Choi ,  Kang-Il Lee ,  Chang Mog Jo

IPC: C23C16/455 ,  H01L21/02 ,  C23C16/448 ,  C23C16/04 ,  C23C14/24 ,  C23C14/04 ,  C23C14/12 ,  C23C14/56

CPC classification number: H01L21/02107 ,  C23C14/04 ,  C23C14/044 ,  C23C14/12 ,  C23C14/24 ,  C23C14/243 ,  C23C14/564 ,  C23C16/04 ,  C23C16/042 ,  C23C16/448 ,  C23C16/4485 ,  C23C16/45563

Abstract: A method of forming a thin film on a substrate includes arranging the substrate to face a thin film deposition apparatus; and discharging a deposition material via a deposition source of the thin film deposition apparatus onto the substrate; wherein a deposition source nozzle unit of the thin film deposition apparatus is disposed at a side of the deposition source and includes a plurality of deposition source nozzles arranged in a first direction; wherein a patterning slit sheet of the thin film deposition apparatus is disposed to be between the deposition source nozzle unit and the substrate, the patterning slit sheet including a plurality of patterning slits, and wherein each of the patterning slits includes a plurality of sub-slits.

Abstract translation: 在基板上形成薄膜的方法包括将基板布置成面对薄膜沉积设备; 以及通过所述薄膜沉积设备的沉积源将沉积材料排出到所述衬底上; 其中所述薄膜沉积设备的沉积源喷嘴单元设置在所述沉积源的一侧，并且包括沿第一方向布置的多个沉积源喷嘴; 其中，所述薄膜沉积设备的图案化狭缝片设置在所述沉积源喷嘴单元和所述基板之间，所述图案化缝隙片包括多个图案化缝隙，并且其中每个所述图案化缝隙包括多个子狭缝 。