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    Coating composition for photoresist underlayer
    3.
    发明授权
    Coating composition for photoresist underlayer 有权

    公开(公告)号：US11762294B2

    公开(公告)日：2023-09-19

    申请号：US17007877

    申请日：2020-08-31

    申请人： ROHM AND HAAS ELECTRONIC MATERIALS LLC

    发明人： Joshua Kaitz ,  Sheng Liu ,  Li Cui ,  Shintaro Yamada ,  Suzanne M. Coley ,  Iou-Sheng Ke

    IPC分类号： G03F7/11 ,  G03F7/09

    CPC分类号： G03F7/11 ,  G03F7/091 ,  G03F7/094

    摘要： A photoresist underlayer composition, comprising a polymer comprising a repeating unit of formula (1):




    wherein Ar is a monocyclic or polycyclic C5-60 aromatic group, wherein the aromatic group comprises one or more aromatic ring heteroatoms, a substituent group comprising a heteroatom, or a combination thereof; R1 is hydrogen, substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C1-30 heteroalkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C2-30 heterocycloalkyl, substituted or unsubstituted C2-30 alkenyl, substituted or unsubstituted C2-30 alkynyl, substituted or unsubstituted C6-30 aryl, substituted or unsubstituted C7-30 arylalkyl, substituted or unsubstituted C7-30 alkylaryl, substituted or unsubstituted C3-30 heteroaryl, or substituted or unsubstituted C4-30 heteroarylalkyl; and R2 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C1-30 heteroalkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C2-30 heterocycloalkyl, substituted or unsubstituted C2-30 alkenyl, substituted or unsubstituted C2-30 alkynyl, substituted or unsubstituted C6-30 aryl, substituted or unsubstituted C7-30 arylalkyl, substituted or unsubstituted C7-30 alkylaryl, substituted or unsubstituted C3-30 heteroaryl, or substituted or unsubstituted C4-30 heteroarylalkyl, wherein R1 and R2 can be optionally taken together to form a ring.

    COATING COMPOSITION FOR PHOTORESIST UNDERLAYER
    4.
    发明申请
    COATING COMPOSITION FOR PHOTORESIST UNDERLAYER 有权

    公开(公告)号：US20220066320A1

    公开(公告)日：2022-03-03

    申请号：US17007877

    申请日：2020-08-31

    申请人： ROHM AND HAAS ELECTRONIC MATERIALS LLC

    发明人： Joshua Kaitz ,  Sheng Liu ,  Li Cui ,  Shintaro Yamada ,  Suzanne M. Coley ,  Iou-Sheng Ke

    IPC分类号： G03F7/11 ,  G03F7/09

    摘要： A photoresist underlayer composition, comprising a polymer comprising a repeating unit of formula (1): wherein Ar is a monocyclic or polycyclic C5-60 aromatic group, wherein the aromatic group comprises one or more aromatic ring heteroatoms, a substituent group comprising a heteroatom, or a combination thereof; R1 is hydrogen, substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C1-30 heteroalkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C2-30 heterocycloalkyl, substituted or unsubstituted C2-30 alkenyl, substituted or unsubstituted C2-30 alkynyl, substituted or unsubstituted C6-30 aryl, substituted or unsubstituted C7-30 arylalkyl, substituted or unsubstituted C7-30 alkylaryl, substituted or unsubstituted C3-30 heteroaryl, or substituted or unsubstituted C1-30 heteroarylalkyl; and R2 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C1-30 heteroalkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C2-30 heterocycloalkyl, substituted or unsubstituted C2-30 alkenyl, substituted or unsubstituted C2-30 alkynyl, substituted or unsubstituted C6-30 aryl, substituted or unsubstituted C7-30 arylalkyl, substituted or unsubstituted C7-30 alkylaryl, substituted or unsubstituted C3-30 heteroaryl, or substituted or unsubstituted C4-30 heteroarylalkyl, wherein R1 and R2 can be optionally taken together to form a ring.

    Coating compositions and methods of forming electronic devices
    6.
    发明授权
    Coating compositions and methods of forming electronic devices 有权

    公开(公告)号：US11817316B2

    公开(公告)日：2023-11-14

    申请号：US17231339

    申请日：2021-04-15

    申请人： Rohm and Haas Electronic Materials LLC

    发明人： Sheng Liu ,  James F. Cameron ,  Iou-Sheng Ke ,  Shintaro Yamada ,  Li Cui

    IPC分类号： H01L21/027 ,  C09D163/00 ,  C08G59/62 ,  C09D7/63 ,  C07C33/28 ,  C07C43/205 ,  C07C69/76 ,  C09D7/20 ,  G03F7/20 ,  G03F7/00 ,  G03F7/075 ,  G03F7/09 ,  G03F7/11 ,  G03F7/004 ,  G03F1/56 ,  G03F7/025 ,  G03F7/16 ,  G03F7/26

    CPC分类号： H01L21/0276 ,  C09D163/00 ,  G03F7/0035 ,  G03F7/075 ,  G03F7/091 ,  G03F7/11

    摘要： Coating compositions comprise: a B-staged reaction product of one or more compounds comprising: a core chosen from C6-50 carbocyclic aromatic, C2-50 heterocyclic aromatic, C1-20 aliphatic, C1-20 heteroaliphatic, C3-20 cycloaliphatic, and C2-20 heterocycloaliphatic, each of which may be substituted or unsubstituted; and two or more substituents of formula (1) attached to the core:




    wherein: Ar1 is an aromatic group independently chosen from C6-50 carbocyclic aromatic and C2-50 heteroaromatic, each of which may be substituted or unsubstituted; Z is a substituent independently chosen from OR1, protected hydroxyl, carboxyl, protected carboxyl, SR1, protected thiol, —O—C(═O)—C1-6 alkyl, halogen, and NHR2; wherein each R1 is independently chosen from H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, and C5-30 aryl; each R2 is independently chosen from H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, C5-30 aryl, C(═O)—R1, and S(═O)2—R1; x is an integer from 1 to the total number of available aromatic ring atoms in Ar1; and * denotes the point of attachment to the core; provided that when the core comprises an aromatic ring, no substituents of formula (1) are in an ortho position to each other on the same aromatic ring of the core; and one or more solvents, wherein the total solvent content is from 50 to 99 wt % based on the coating composition. Coated substrates formed with the coating compositions and methods of forming electronic devices using the compositions are also provided. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.