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公开(公告)号：US09029262B2
公开(公告)日：2015-05-12
申请号：US13761509
申请日：2013-02-07
申请人： Tokyo Ohka Kogyo Co., Ltd. , Riken
发明人： Takahiro Senzaki , Ken Miyagi , Shigenori Fujikawa
IPC分类号： H01L21/768 , G03F7/00 , H01L21/027 , H01L21/033 , H01L21/311
CPC分类号： H01L21/76802 , G03F7/00 , G03F7/0002 , H01L21/0271 , H01L21/0337 , H01L21/31144
摘要： A method of forming a contact hole pattern, including: a block copolymer layer forming step in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a substrate having on a surface thereof a thin film with a hole pattern formed, so as to cover the thin film; a phase separation step in which the layer containing the block copolymer is subjected to phase separation; a selective removing step in which phase of at least one block of the plurality of blocks constituting the block copolymer is removed, wherein hole diameter of the hole pattern formed on the thin film is 0.8 to 3.1 times period of the block copolymer, and in the layer forming step, thickness between upper face of the thin film and surface of the layer containing the block copolymer is 70% or less of thickness of the thin film.
摘要翻译： 一种形成接触孔图形的方法，包括：嵌段共聚物层形成步骤，其中在其表面上形成具有多个块结合的嵌段共聚物的层，所述基材具有形成有孔图案的薄膜， 以覆盖薄膜; 相分离步骤，其中含有嵌段共聚物的层进行相分离; 选择性除去步骤，其中去除构成嵌段共聚物的多个嵌段的至少一个嵌段的相，其中形成在薄膜上的孔图案的孔径为嵌段共聚物的0.8〜3.1倍，在 层形成步骤，薄膜的上表面和含有嵌段共聚物的层的表面之间的厚度为薄膜的厚度的70％以下。
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公开(公告)号：US20140054265A1
公开(公告)日：2014-02-27
申请号：US13927464
申请日：2013-06-26
申请人： Tokyo Ohka Kogyo Co., Ltd. , Riken
IPC分类号： B81C1/00
CPC分类号： B81C1/00531 , B81C1/00031 , B81C2201/0149 , B81C2201/0198 , H01L21/0337 , H01L21/3086 , H01L21/31133
摘要： A method of forming a fine pattern, including: a phase separation step in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a substrate, and then the layer is heated for phase separation of the layer; a decomposition step in which at least a portion of a phase of at least one block of the plurality of blocks constituting the block copolymer is decomposed; a selective removal step in which the layer is immersed in a developing solution to selectively remove a phase containing decomposed blocks to form a nano structure; and an etching step in which the substrate is subjected to etching by using the nano structure as a mask; and a main component of the developing solution is an organic solvent having an SP value of 7.5 to 11.5 (cal/cm3)1/2, and having vapor pressure of less than 2.1 kPa at 25° C., or is benzene that may be substituted by an alkyl group, an alkoxy group, or a halogen atom, and the developing solution further contains metal alkoxide.
摘要翻译： 一种形成精细图案的方法，包括：相位分离步骤，其中在基板上形成含有多个键合的嵌段共聚物的层，然后将该层加热以使该层相分离; 分解步骤，其中构成所述嵌段共聚物的多个嵌段的至少一个嵌段的至少一部分相分解; 选择性去除步骤，其中将该层浸入显影溶液中以选择性地除去含有分解嵌段的相以形成纳米结构; 以及通过使用纳米结构作为掩模对基板进行蚀刻的蚀刻步骤; 显影液的主要成分是在25℃下SP值为7.5〜11.5（cal / cm 3）1/2，蒸气压小于2.1kPa的有机溶剂，也可以是苯 被烷基，烷氧基或卤素原子取代，显影液还含有金属醇盐。
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公开(公告)号：US20130210231A1
公开(公告)日：2013-08-15
申请号：US13761509
申请日：2013-02-07
申请人： TOKYO OHKA KOGYO CO., LTD. , RIKEN
发明人： Takahiro Senzaki , Ken Miyagi , Shigenori Fujikawa
IPC分类号： H01L21/768
CPC分类号： H01L21/76802 , G03F7/00 , G03F7/0002 , H01L21/0271 , H01L21/0337 , H01L21/31144
摘要： A method of forming a contact hole pattern, including: a block copolymer layer forming step in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a substrate having on a surface thereof a thin film with a hole pattern formed, so as to cover the thin film; a phase separation step in which the layer containing the block copolymer is subjected to phase separation; a selective removing step in which phase of at least one block of the plurality of blocks constituting the block copolymer is removed, wherein hole diameter of the hole pattern formed on the thin film is 0.8 to 3.1 times period of the block copolymer, and in the layer forming step, thickness between upper face of the thin film and surface of the layer containing the block copolymer is 70% or less of thickness of the thin film.
摘要翻译： 一种形成接触孔图形的方法，包括：嵌段共聚物层形成步骤，其中在其表面上形成具有多个块结合的嵌段共聚物的层，所述基材具有形成有孔图案的薄膜， 以覆盖薄膜; 相分离步骤，其中含有嵌段共聚物的层进行相分离; 选择性除去步骤，其中去除构成嵌段共聚物的多个嵌段的至少一个嵌段的相，其中形成在薄膜上的孔图案的孔径为嵌段共聚物的0.8〜3.1倍，在 层形成步骤，薄膜的上表面和含有嵌段共聚物的层的表面之间的厚度为薄膜的厚度的70％以下。
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公开(公告)号：US08961802B2
公开(公告)日：2015-02-24
申请号：US13927464
申请日：2013-06-26
申请人： Riken , Tokyo Ohka Kogyo Co., Ltd.
IPC分类号： B81C1/00 , H01L21/033 , H01L21/308 , H01L21/311
CPC分类号： B81C1/00531 , B81C1/00031 , B81C2201/0149 , B81C2201/0198 , H01L21/0337 , H01L21/3086 , H01L21/31133
摘要： A method of forming a fine pattern, including: a phase separation step in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a substrate, and then the layer is heated for phase separation of the layer; a decomposition step in which at least a portion of a phase of at least one block of the plurality of blocks constituting the block copolymer is decomposed; a selective removal step in which the layer is immersed in a developing solution to selectively remove a phase containing decomposed blocks to form a nano structure; and an etching step in which the substrate is subjected to etching by using the nano structure as a mask; and a main component of the developing solution is an organic solvent having an SP value of 7.5 to 11.5 (cal/cm3)1/2, and having vapor pressure of less than 2.1 kPa at 25° C., or is benzene that may be substituted by an alkyl group, an alkoxy group, or a halogen atom, and the developing solution further contains metal alkoxide.
摘要翻译： 一种形成精细图案的方法，包括：相位分离步骤，其中在基板上形成含有多个键合的嵌段共聚物的层，然后将该层加热以使该层相分离; 分解步骤，其中构成所述嵌段共聚物的多个嵌段的至少一个嵌段的至少一部分相分解; 选择性去除步骤，其中将该层浸入显影溶液中以选择性地除去含有分解嵌段的相以形成纳米结构; 以及通过使用纳米结构作为掩模对基板进行蚀刻的蚀刻步骤; 显影液的主要成分是在25℃下SP值为7.5〜11.5（cal / cm 3）1/2，蒸气压小于2.1kPa的有机溶剂，也可以是苯 被烷基，烷氧基或卤素原子取代，显影液还含有金属醇盐。
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公开(公告)号：US11547968B2
公开(公告)日：2023-01-10
申请号：US16639809
申请日：2018-08-03
发明人： Takuya Noguchi , Takahiro Senzaki , Toshiyuki Ogata , Toyoki Kunitake , Shigenori Fujikawa , Miho Ariyoshi
摘要： The present invention provides: a gas separation method which is capable of desirably separating a slight amount of a component from a mixed gas under mild conditions such that the pressure difference between both sides of a gas separation membrane is 1 atmosphere or less; and a gas separation membrane which is suitable for use in this gas separation method. According to the present invention, in a gas separation method wherein a specific gas (A) in a mixed gas, which contains the specific gas (A) at a concentration of 1,000 ppm by mass or less, is selectively permeated with use of a gas separation membrane, an extremely thin gas separation membrane that has a film thickness of 1 μm or less is used, so that the gas (A) is desirably separated under mild conditions such that the pressure difference between both sides of the gas separation membrane is 1 atmosphere or less.
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公开(公告)号：US10751672B2
公开(公告)日：2020-08-25
申请号：US15646282
申请日：2017-07-11
IPC分类号： B01D71/70 , B01D71/44 , C08G77/18 , C08G77/16 , C08G77/20 , C08G77/398 , C08L43/04 , B01D53/22 , B01D67/00 , C08G77/58
摘要： The present invention provides a gas-permeable membrane comprising a partial structure represented by formula (I) or formula (II), (wherein R1 and R2 each independently represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyloxy group having 2 to 6 carbon atoms, an aryl group or an aryloxy group, M1, M2 and M3 each independently represents a metal atom, m1 represents an integer, n1, n2 and n3 each independently represents an integer of 1 to 3, * represents a bonding hand), a composition for forming the gas-permeable membrane and a production process of the gas-permeable membrane.
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7.发明申请COMPOSITE LAYER MATERIAL, METHOD FOR MANUFACTURING MEMBRANE, AND METHOD FOR MANUFACTURING LAYERED BODY 审中-公开复合层材料，制造膜的方法和制造层状体的方法公开(公告)号：US20160152008A1
公开(公告)日：2016-06-02
申请号：US14903417
申请日：2014-07-09
CPC分类号： B32B27/06 , B01D67/0002 , B01D69/06 , B01D69/10 , B01D71/46 , B01D71/60 , B29C39/14 , B29D99/005 , B29K2079/085 , B29L2031/755 , B32B7/06 , B32B27/08 , B32B27/28 , B32B27/38 , B32B38/10 , B32B2037/243 , B32B2307/7166 , C08J5/18
摘要： A composite layer material including at least two laminated layers. One of outermost layers is a support film that is removable from another layer and has a self-supporting property.
摘要翻译： 一种复合层材料，其包括至少两层叠层。 最外层之一是可从另一层移除并具有自支撑性质的支撑膜。
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公开(公告)号：US20150375176A1
公开(公告)日：2015-12-31
申请号：US14748932
申请日：2015-06-24
CPC分类号： B01D69/12 , B01D65/003 , B01D67/002 , B01D67/0034 , B01D69/10 , B01D71/46 , B01D2325/24
摘要： A membrane filter including a thin film having a nanometer order thickness as a base, which is easy to increase in size, and which has sufficient strength. The membrane filter is formed by laminating a thin film having a thickness of 1 to 1,000 nm with a support film which is a porous film having a thickness of 1 to 1,000 μm, which is made of a photosensitive composition or a cured product of the photosensitive composition, and has a plurality of hole portions penetrating in the thickness direction.
摘要翻译： 一种膜过滤器，其包括具有纳米级厚度的基底的薄膜，其容易增大，并且具有足够的强度。 膜过滤器是通过将厚度为1〜1000nm的薄膜与由感光性组合物或感光性物质的固化物形成的厚度为1〜1000μm的多孔膜的支撑膜层叠而形成的 并且具有在厚度方向上贯穿的多个孔部。
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