专利检索 ap:("Quantum MicroMaterials, Inc.") AND inv:"John S. Althaus" 第 1 页

1.

发明授权
Coating substrate by polymerization of amine compound and apparatus having polymer coated substrate 有权

公开(公告)号：US12077646B2

公开(公告)日：2024-09-03

申请号：US17380931

申请日：2021-07-20

申请人： Quantum MicroMaterials, Inc.

发明人： Sung-Chan Jo , Kyonghoon Lee , John S. Althaus , Hyung Jin Park

IPC分类号： C08J7/06 , C23C16/02 , C23C16/56

CPC分类号： C08J7/06 , C23C16/02 , C23C16/56 , C08J2379/00

摘要： This application features a method of forming a polymer layer on the surface of a substrate using a self-initiating monomer. A polymer layer is formed by polymerization of a monomer on a metal layer to fill or cover defects of the metal layer. The metal layer the polymer layer may be used as an airtight material.