High Aspect Ratio Microelectrode Arrays Enabled to Have Customizable Lengths and Methods of Making the Same
    1.
    发明申请
    High Aspect Ratio Microelectrode Arrays Enabled to Have Customizable Lengths and Methods of Making the Same 有权
    高长宽比微电极阵列具有可定制长度和制作相同的方法

    公开(公告)号:US20120138335A1

    公开(公告)日:2012-06-07

    申请号:US12996356

    申请日:2009-06-03

    IPC分类号: H05K1/00 C25F3/02 H05K3/00

    摘要: A method of fabricating an array of micro electrodes enabled to have customizable lengths. A substantially criss-cross pattern of channels on a top surface of the work-piece substrate (10) is formed using electrical discharge machining to form a plurality of shaped columns (20) having tapered profiles. The shaped columns have a tapering profile which extends at least 50% of the length of the columns. The plurality of shaped columns is etched to sharpen the tapered tips into needle tips forming the array of microelectrodes.

    摘要翻译: 一种制造能够具有可定制长度的微电极阵列的方法。 使用放电加工形成在工件衬底(10)的顶表面上的通道的基本十字交叉图案,以形成具有锥形轮廓的多个成形柱(20)。 成形柱具有延伸至柱的长度的至少50%的锥形轮廓。 蚀刻多个成形柱以将锥形尖端锐化成形成微电极阵列的针尖。

    High aspect ratio microelectrode arrays enabled to have customizable lengths and methods of making the same
    2.
    发明授权
    High aspect ratio microelectrode arrays enabled to have customizable lengths and methods of making the same 有权
    高长宽比微电极阵列能够具有可定制的长度和制造相同的方法

    公开(公告)号:US08886279B2

    公开(公告)日:2014-11-11

    申请号:US12996356

    申请日:2009-06-03

    IPC分类号: A61B5/0478 A61N1/05

    摘要: A method of fabricating an array of micro electrodes enabled to have customizable lengths. A substantially criss-cross pattern of channels on a top surface of the work-piece substrate (10) is formed using electrical discharge machining to form a plurality of shaped columns (20) having tapered profiles. The shaped columns have a tapering profile which extends at least 50% of the length of the columns. The plurality of shaped columns is etched to sharpen the tapered tips into needle tips forming the array of microelectrodes.

    摘要翻译: 一种制造能够具有可定制长度的微电极阵列的方法。 使用放电加工形成在工件衬底(10)的顶表面上的通道的基本十字交叉图案,以形成具有锥形轮廓的多个成形柱(20)。 成形柱具有延伸至柱的长度的至少50%的锥形轮廓。 蚀刻多个成形柱以将锥形尖端锐化成形成微电极阵列的针尖。

    Three Dimensional Penetrating Optical-Electrical Neural Interface for Selective Stimulation and Recording
    3.
    发明申请
    Three Dimensional Penetrating Optical-Electrical Neural Interface for Selective Stimulation and Recording 审中-公开
    用于选择性刺激和记录的三维穿透光电神经接口

    公开(公告)号:US20130046148A1

    公开(公告)日:2013-02-21

    申请号:US13508969

    申请日:2010-11-09

    IPC分类号: A61N5/06 A61B5/05

    摘要: A hybrid optical-electrical neural interface is disclosed and described. The neural interface can include an array (100) having a plurality of micro-optrodes (HO). The micro-optrodes (110) are capable of optical and optionally electrical stimulation and recording, allowing bidirectional, multi-modal communication with neural tissue. At least a portion of the plurality of micro-optrodes (110) are independently optically addressable and include an optical waveguide along each micro-optrode (HO). Combining optical stimulation with electrical recording can allow artifact-free recording from nearby electrodes and in some cases even the same electrode, which is difficult to achieve with combined electrical recording and stimulation. The optical waveguide is configured to direct light towards a distal end (125) of the micro-optrode, allowing focal stimulation and recording. Penetrating micro-optrodes (110) can allow access to deep tissue, while non-penetrating micro-optrodes can be used for extraneural stimulation.

    摘要翻译: 公开并描述了混合光电神经接口。 神经接口可以包括具有多个微光栅(HO)的阵列(100)。 微光学(110)能够进行光学和可选的电刺激和记录,允许与神经组织的双向多模式通信。 多个微光栅(110)的至少一部分是独立的可光学寻址的并且包括沿着每个微光栅(HO)的光波导。 将光学刺激与电气记录结合可以允许来自附近电极的无伪影记录,并且在某些情况下甚至可以使用组合的电记录和刺激难以实现的相同电极。 光波导被配置为将光引导到微电极的远端(125),从而允许焦点刺激和记录。 穿透性微电极(110)可以允许进入深层组织,而非穿透性微电极可用于外部刺激。