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公开(公告)号：US20230420277A1
公开(公告)日：2023-12-28
申请号：US18328955
申请日：2023-06-05
Inventor： Akihiro ITOU , Hiroshi SHIROUZU , Atsushi HARIKAI
IPC: H01L21/67
CPC classification number: H01L21/67253
Abstract: Disclosed is a recipe proposal device 10 including: an input section 11 for inputting a target information regarding a target shape of a substrate to be processed in a substrate processing apparatus; a recipe proposal section 12 that proposes a process recipe used in the substrate processing apparatus in order to form the target shape, based on the target information; a calculation section 13 that calculates a prediction information regarding a predicted shape when the substrate is processed in the substrate processing apparatus using the process recipe; and a display section 14 that displays the target information and the prediction information.
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公开(公告)号：US20220326684A1
公开(公告)日：2022-10-13
申请号：US17658674
申请日：2022-04-11
Inventor： Hiroshi SHIROUZU
IPC: G05B19/418 , G06K9/62 , G06Q50/04
Abstract: A production equipment monitoring system 20 including: an anomaly index determination unit 23 determining an anomaly index a of a production equipment 10, based on a feature quantity obtained from an equipment information on the production equipment 10; a relevance determination unit 24 determining a degree of relevance D between each of anomalous conditions predicable to occur in the production equipment 10 and an observed condition of the production equipment 10; a detection threshold determination unit 25 determining a single detection threshold th for detecting a degree of anomaly A of the production equipment 10, based on anomaly thresholds at which are thresholds of the anomaly index a corresponding respectively to the anomalous conditions, and on the degree of relevance D; and an anomaly degree detection unit 26 detecting the degree of anomaly A of the production equipment 10, based on the anomaly index a and the detection threshold th.
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公开(公告)号：US20220336197A1
公开(公告)日：2022-10-20
申请号：US17658670
申请日：2022-04-11
Inventor： Hiroshi SHIROUZU
IPC: H01J37/32
Abstract: A disclosed plasma processing system 10 includes: a plasma processing apparatus 100 including a processing chamber 100a for plasma processing an object 400 to be processed, and at least one component 122, 131 which is at least partially disposed in the processing chamber 100a; a storage unit 301 for storing a recipe including a set value specifying a plasma processing condition; a tolerance determination unit 302 that determines a tolerance of the set value, based on a degree of deterioration of the at least one component 122, 131; and a recipe modification unit 303 that modifies the recipe such that the set value falls within the tolerance, when the set value is outside the tolerance.
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公开(公告)号：US20190389673A1
公开(公告)日：2019-12-26
申请号：US16430571
申请日：2019-06-04
Inventor： Hiroshi SHIROUZU , Osamu MIZUNO
Abstract: A mover according to the present disclosure includes: a body to move; a second member; a suction unit; a location detection unit; a first moving part, and a second moving part. The second member moves in a state where the second member is combined with a first member provided for an object, as the body is displaced relative to the object. The suction unit is sucked to the object in the state where the second member is combined with the first member. The location detection unit detects a location of the body with respect to the object by detecting movement of the second member. The first moving part moves the body until the state where the second member is combined with the first member is established. The second moving part displaces the body relative to the object in the state where the second member is combined with the first member.
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Patent Agency Ranking
5.发明申请公开(公告)号：US20190227559A1
公开(公告)日：2019-07-25
申请号：US16221649
申请日：2018-12-17
Inventor： Hiroshi SHIROUZU , Yoshihiro IKAWA , Osamu MIZUNO
Abstract: Disclosed herein is a mover including an object detecting unit and either a masking processing unit or a transmission restricting unit as an additional processing unit. The object detecting unit detects an object based on a reception signal output from a receiver unit by having a transmitter unit transmit a scanning wave and by having the receiver unit receive a reflected wave, which is a component, reflected from the object, of the scanning wave. The masking processing unit performs masking processing of masking, in accordance with a timing at which, and/or a direction of incidence in which, a disturbance wave, not depending on the scanning wave, is incident on the receiver unit, a portion of the reception signal output from the receiver unit. The transmission restricting unit restricts a transmission range in which the transmitter unit transmits the scanning wave.
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公开(公告)号：US20190225195A1
公开(公告)日：2019-07-25
申请号：US16237846
申请日：2019-01-02
Inventor： Hiroshi SHIROUZU , Tohru NAKAMURA
Abstract: Disclosed herein is a mover including a plurality of wheels, a body, and a friction braking mechanism. The body has a bottom surface. The body is supported by the plurality of wheels with the bottom surface facing a traveling surface, and travels on the traveling surface by turning the plurality of wheels. The friction braking mechanism applies a brake on the body with at least a portion of the bottom surface or at least a portion of a movable body brought into contact with the traveling surface by switching, while the body is traveling, a state of the movable body from a first state into a second state. The second state is a state where the movable body protrudes from the bottom surface to a different height from in the first state.
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公开(公告)号：US20240038511A1
公开(公告)日：2024-02-01
申请号：US18354058
申请日：2023-07-18
Inventor： Hiroshi SHIROUZU
IPC: H01J37/32
CPC classification number: H01J37/32935 , H01J2237/334
Abstract: Disclosed is a plasma processing apparatus 100 including: a chamber 101 in which plasma processing is performed; an electrode part 105 configured to be applied with a high-frequency power for generating a plasma in the chamber 101; a plasma sensor 160 for measuring a measured value MV corresponding to an electric potential of the plasma; a threshold determination section 122 for determining a threshold TH, depending on a plasma processing condition; and a judgment section 123 for judging presence or absence of abnormal discharge in the chamber 101, based on the measured value MV and the threshold TH.
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公开(公告)号：US20230282463A1
公开(公告)日：2023-09-07
申请号：US18176516
申请日：2023-03-01
Inventor： Hiroshi SHIROUZU
IPC: H01J37/32
CPC classification number: H01J37/32935 , H01J37/32532 , H01J37/32174
Abstract: A plasma potential measuring device, including: a detection electrode 162b which is disposed so as to face a plasma P generated in a chamber and at which an electric charge corresponding to an electric potential of the plasma is induced; a potential changing circuit 203 for changing a reference potential of the detection electrode 162b; and a detection circuit 202 for detecting an amount of electric charge or potential induced at the detection electrode 162b.
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公开(公告)号：US20190243374A1
公开(公告)日：2019-08-08
申请号：US16243376
申请日：2019-01-09
Inventor： Yoshihiro IKAWA , Hiroshi SHIROUZU , Osamu MIZUNO
CPC classification number: G05D1/0231 , G05D1/0088 , G05D2201/0216 , G06K9/00791 , G06T7/0002 , G06T2207/10024 , G06T2207/10028 , G06T2207/10048 , G06T2207/30261 , H04N5/247
Abstract: Disclosed herein is a carrier including a body, a sensor, and an output unit. The body has the ability to travel autonomously and includes a holding mechanism for holding a burden. The sensor is provided for the body and detects a situation surrounding the body. The output unit outputs detected information, collected by the sensor, about the situation to a management device that manages operation of another carrier.
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