公开(公告)号：US20200006670A1

公开(公告)日：2020-01-02

申请号：US16272969

申请日：2019-02-11

Applicant: POSTECH ACADEMY-INDUSTRY FOUNDATION

Inventor： Joon Hak OH ,  Xiaobo SHANG ,  Inho SONG

IPC: H01L51/00

Abstract: A chiral organic ligand according to an exemplary embodiment is any one selected from the group consisting of organic ligands represented by the following Chemical Formula 1 and Chemical Formula 2: wherein X1 and X2 independently of each other R1, R3, R5, and R7 are independently of one another any one selected from the group consisting of a carboxy group, a hydroxyl group, an amino group, a sulfhydryl group, and a phosphate; and R2, R4, R6, and R8 are independently of one another any one selected from the group consisting of C1 to C5 alkyl groups and C1 to C5 aryl groups.

公开(公告)号：US20180083190A1

公开(公告)日：2018-03-22

申请号：US15700530

申请日：2017-09-11

Applicant: POSTECH ACADEMY-INDUSTRY FOUNDATION

Inventor： Joon Hak OH ,  Yoonho LEE

IPC: H01L51/00 ,  H01L51/42

CPC classification number: H01L51/0003 ,  G03F7/0002 ,  H01L51/0019 ,  H01L51/422 ,  H01L51/4226 ,  H01L51/4233 ,  H01L51/424 ,  H01L51/4253 ,  Y02E10/549

Abstract: Disclosed is a method of forming multiple nanopatterns, including (a) forming a block copolymer layer on a substrate, (b) self-assembling the block copolymer layer, thus preparing a phase-separated block copolymer layer including a plurality of patterns, (c) performing stamping on the phase-separated block copolymer layer using a nanoimprinting stamp having a nano-sized pattern, (d) removing at least one from the plurality of patterns, thus preparing a multiple-nanopatterned block copolymer layer, (e) performing etching using the multiple-nanopatterned block copolymer layer as a mask, thus preparing a multiple-nanopatterned substrate, (f) subjecting the multiple-nanopatterned substrate to surface treatment, and (g) applying a liquid polymer on the multiple-nanopatterned substrate and then performing thermal treatment, thus