公开(公告)号：US20160332365A1

公开(公告)日：2016-11-17

申请号：US15140898

申请日：2016-04-28

Applicant: Nanoscribe GmbH

Inventor： Roman Reinhard Reiner ,  Yann Tanguy ,  Joerg Hoffmann

IPC: B29C67/00 ,  G05B19/4099

CPC classification number: B33Y10/00 ,  B29C64/135 ,  B29C64/277 ,  B33Y80/00 ,  G05B19/4099 ,  G05B2219/35134 ,  G05B2219/49007

Abstract: A method for producing a three-dimensional overall structure (18) by a structuring device (10a, 10b), which has a predefined principal direction (16) of the structure entry in a writing region (20). The overall structure (18) is defined by sequential definition of a plurality of partial structures (22) that complement one another overall to form the overall structure (18). The partial structures (22) are delimited in each case within enveloping interfaces (36). In this case, the partial structures (22) are chosen in such a way that the enveloping interfaces (36) extend obliquely with respect to the principal direction (16) of the structure entry.

Abstract translation: 一种通过结构化装置（10a，10b）制造三维整体结构（18）的方法，该结构装置具有在书写区域（20）中的结构入口的预定主方向（16）。 总体结构（18）由多个部分结构（22）的顺序定义来定义，所述多个部分结构（22）整体互补以形成整体结构（18）。 在每个情况下，部分结构（22）在包络界面（36）内界定。 在这种情况下，选择部分结构（22）使得包络界面（36）相对于结构入口的主方向（16）倾斜延伸。

公开(公告)号：US20200147865A1

公开(公告)日：2020-05-14

申请号：US16667803

申请日：2019-10-29

Applicant: Nanoscribe GmbH

Inventor： Joerg Hoffmann ,  Thomas Sauter ,  Christoph Linden ,  Christian Schach

IPC: B29C64/135 ,  G02B21/33 ,  B33Y10/00 ,  B33Y30/00 ,  B29C64/268 ,  B29C64/364 ,  B29C64/35 ,  B33Y40/00

Abstract: A dispenser attachment for microscope objective lenses, in a device for writing three-dimensional structures by means of laser lithography in a lithographic fluid, which can be solidified by irradiation with laser light. The dispenser attachment may be adapted for being placed onto an objective lens.

公开(公告)号：US10118376B2

公开(公告)日：2018-11-06

申请号：US15140898

申请日：2016-04-28

Applicant: Nanoscribe GmbH

Inventor： Roman Reinhard Reiner ,  Yann Tanguy ,  Joerg Hoffmann

IPC: G05B19/4099 ,  B29C64/277 ,  B29C64/135 ,  B33Y10/00 ,  B33Y80/00

Abstract: A method for producing a three-dimensional overall structure (18) by a structuring device (10a, 10b), which has a predefined principal direction (16) of the structure entry in a writing region (20). The overall structure (18) is defined by sequential definition of a plurality of partial structures (22) that complement one another overall to form the overall structure (18). The partial structures (22) are delimited in each case within enveloping interfaces (36). In this case, the partial structures (22) are chosen in such a way that the enveloping interfaces (36) extend obliquely with respect to the principal direction (16) of the structure entry.

公开(公告)号：US09798248B2

公开(公告)日：2017-10-24

申请号：US14801427

申请日：2015-07-16

Applicant: Nanoscribe GmbH

Inventor： Joerg Hoffmann ,  Philipp Simon ,  Michael Thiel ,  Martin Hermatschweiler ,  Holger Fischer

IPC: G03F7/20 ,  G03F7/32

CPC classification number: G03F7/70433 ,  G03F7/20 ,  G03F7/32 ,  G03F7/70466

Abstract: The invention relates to a method for producing a structure in a lithographic material, wherein the structure in the lithographic material is defined by means of a writing beam of an exposure device, in that a plurality of partial structures are written sequentially, wherein for writing the partial structures a write field of the exposure device is displaced and positioned sequentially and that a partial structure is written in the write field in each case, and wherein for positioning of the write field a reference structure is detected by means of an imaging measuring device. For calibration of the write field in the respectively positioned write field, before, during or after writing a partial structure, at least one reference structure element assigned to this partial structure is produced in the lithographic material with the writing beam, wherein the reference structure element after the displacement of the write field is detected by means of the imaging measuring device for writing a further partial structure.