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公开(公告)号：US20190170634A1
公开(公告)日：2019-06-06
申请号：US15994958
申请日：2018-05-31
发明人： Paul A. DOYLE , Ryan Tsai , Morgan A. Crouch
摘要： A purge system includes a purge gas distribution manifold that includes at least one port through which light beam from an optical metrology or inspection head is transmitted. The purge gas distribution manifold includes a bottom surface having one or more apertures through which purge gas is expelled. The bottom surface is held in close proximity to the top surface of the substrate and the apertures may be distributed over the bottom surface of the purge gas distribution manifold so that purge gas is uniformly distributed over the entirety of the top surface of the substrate at all measurement positions of the substrate with respect to the optical metrology or inspection head.
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公开(公告)号：US20200035531A1
公开(公告)日：2020-01-30
申请号：US16048200
申请日：2018-07-27
发明人： Paul A. DOYLE , Morgan A. CROUCH
IPC分类号： H01L21/673 , H01L21/67 , B08B5/00
摘要： A load port for loading wafers to and unloading wafers from a front opening unified pod (FOUP) includes a shield member that covers and provides a seal over an opening of the FOUP. The shield member includes a narrow wafer slot that is sized to allow a single wafer to be loaded to or unloaded from the FOUP but otherwise minimize loss of the purge environment within the FOUP. The shield member is movable so that the wafer slot may be moved vertically to provide a wafer transfer robot access to any desired wafer position within the FOUP. The shield member, for example, may be a flexible sheet that is held taut and is rolled onto and off of at least one roller to vertically position the wafer slot. The shield member may alternatively be one or more rigid members that slide on rails to vertically position the wafer slot.
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公开(公告)号：US20200011786A1
公开(公告)日：2020-01-09
申请号：US16571729
申请日：2019-09-16
发明人： Paul A. DOYLE , Ryan TSAI , Morgan A. CROUCH
摘要： A purge system includes a purge gas distribution manifold that includes at least one port through which light beam from an optical metrology or inspection head is transmitted. The purge gas distribution manifold includes a bottom surface having one or more apertures through which purge gas is expelled. The bottom surface is held in close proximity to the top surface of the substrate and the apertures may be distributed over the bottom surface of the purge gas distribution manifold so that purge gas is uniformly distributed over the entirety of the top surface of the substrate at all measurement positions of the substrate with respect to the optical metrology or inspection head.
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