Light emitting device and method of producing a light emitting device
    1.
    发明授权
    Light emitting device and method of producing a light emitting device 有权
    发光装置及其制造方法

    公开(公告)号:US07768031B2

    公开(公告)日:2010-08-03

    申请号:US11677251

    申请日:2007-02-21

    IPC分类号: H01L33/26 H05B33/14

    摘要: To provide a DC drive type inorganic light emitting device excellent in luminous efficiency, provided is a light emitting device, including: a substrate; and a first layer and a second layer laminated on the substrate, in which the second layer is formed of a first portion containing Zn and at least one element chosen from S and Se as its constituent elements; and a second portion containing at least one element chosen from Cu and Ag and at least one element chosen from S and Se as its constituent elements; the first layer is made of a light emitting layer formed of at least one element chosen from S and Se and of Zn; and, in the second layer, the second portion has a cross section parallel to the substrate which tapers toward the first layer.

    摘要翻译: 为了提供发光效率优异的直流驱动型无机发光装置,提供了一种发光装置,包括:基板; 以及层叠在所述基板上的第一层和第二层,其中所述第二层由包含Zn的第一部分和选自S和Se的至少一种元素作为其构成元素形成; 和含有选自Cu和Ag中的至少一种元素的第二部分和选自S和Se的至少一种元素作为其组成元素; 第一层由由至少一种选自S和Se的元素和Zn形成的发光层制成; 并且在第二层中,第二部分具有平行于基板的横截面朝向第一层逐渐变细的横截面。

    METHOD FOR MANUFACTURING THIN FILM TRANSISTOR
    2.
    发明申请
    METHOD FOR MANUFACTURING THIN FILM TRANSISTOR 有权
    制造薄膜晶体管的方法

    公开(公告)号:US20090269880A1

    公开(公告)日:2009-10-29

    申请号:US12447199

    申请日:2007-11-09

    IPC分类号: H01L21/34

    CPC分类号: H01L29/7869

    摘要: A method for manufacturing a thin film transistor containing an channel layer 11 having indium oxide, including forming an indium oxide film as an channel layer and subjecting the formed indium oxide film to an annealing in an oxidizing atmosphere.

    摘要翻译: 一种制造薄膜晶体管的方法,该薄膜晶体管含有具有氧化铟的沟道层11,包括形成氧化铟膜作为沟道层,并使所形成的氧化铟膜在氧化气氛中进行退火。

    OXYNITRIDE SEMICONDUCTOR
    3.
    发明申请
    OXYNITRIDE SEMICONDUCTOR 有权
    氧化硅半导体

    公开(公告)号:US20100109002A1

    公开(公告)日:2010-05-06

    申请号:US12532185

    申请日:2008-04-23

    IPC分类号: H01L29/12

    CPC分类号: H01L29/7869 H01L29/247

    摘要: Provided is an oxynitride semiconductor comprising a metal oxynitride. The metal oxynitride contains Zn and at least one element selected from the group consisting of In, Ga, Sn, Mg, Si, Ge, Y, Ti, Mo, W, and Al. The metal oxynitride has an atomic composition ratio of N, N/(N+O), of 7 atomic percent or more to 80 atomic percent or less.

    摘要翻译: 提供了包含金属氮氧化物的氧氮化物半导体。 金属氮氧化物含有Zn和选自In,Ga,Sn,Mg,Si,Ge,Y,Ti,Mo,W和Al中的至少一种元素。 金属氮氧化物的原子组成比为N,N /(N + O),为7原子%以上且在80原子%以下。

    FIELD-EFFECT TRANSISTOR
    4.
    发明申请
    FIELD-EFFECT TRANSISTOR 审中-公开
    场效应晶体管

    公开(公告)号:US20090189153A1

    公开(公告)日:2009-07-30

    申请号:US12064302

    申请日:2006-09-05

    IPC分类号: H01L29/12

    摘要: Disclosed herein is a field-effect transistor comprising a channel comprised of an oxide semiconductor material including In and Zn. The atomic compositional ratio expressed by In/(In+Zn) is not less than 35 atomic % and not more than 55 atomic %. Ga is not included in the oxide semiconductor material or the atomic compositional ratio expressed by Ga/(In+Zn+Ga) is set to be 30 atomic % or lower when Ga is included therein. The transistor has improved S-value and field-effect mobility.

    摘要翻译: 本文公开了一种场效应晶体管,其包括由包括In和Zn的氧化物半导体材料构成的沟道。 In /(In + Zn)表示的原子组成比为35原子%以上55原子%以下。 Ga不包括在氧化物半导体材料中,或者当Ga包含Ga时,由Ga /(In + Zn + Ga)表示的原子组成比设定为30原子%以下。 晶体管具有改善的S值和场效应迁移率。

    Metal oxynitride semiconductor containing zinc
    5.
    发明授权
    Metal oxynitride semiconductor containing zinc 有权
    含锌的金属氮氧化物半导体

    公开(公告)号:US08274078B2

    公开(公告)日:2012-09-25

    申请号:US12532185

    申请日:2008-04-23

    IPC分类号: H01L29/10

    CPC分类号: H01L29/7869 H01L29/247

    摘要: Provided is an oxynitride semiconductor comprising a metal oxynitride. The metal oxynitride contains Zn and In and at least one element selected from the group consisting of Ga, Sn, Mg, Si, Ge, Y, Ti, Mo, W, and Al. The metal oxynitride has an atomic composition ratio of N, N/(N+O), of 7 atomic percent or more to 80 atomic percent or less.

    摘要翻译: 提供了包含金属氮氧化物的氧氮化物半导体。 金属氮氧化物含有Zn和In以及选自Ga,Sn,Mg,Si,Ge,Y,Ti,Mo,W和Al中的至少一种元素。 金属氮氧化物的原子组成比为N,N /(N + O),为7原子%以上且在80原子%以下。

    Method for manufacturing thin film transistor
    6.
    发明授权
    Method for manufacturing thin film transistor 有权
    制造薄膜晶体管的方法

    公开(公告)号:US08084307B2

    公开(公告)日:2011-12-27

    申请号:US12447199

    申请日:2007-11-09

    IPC分类号: H01L21/84 H01L21/00

    CPC分类号: H01L29/7869

    摘要: A method for manufacturing a thin film transistor containing an channel layer 11 having indium oxide, including forming an indium oxide film as an channel layer and subjecting the formed indium oxide film to an annealing in an oxidizing atmosphere.

    摘要翻译: 一种制造薄膜晶体管的方法,该薄膜晶体管含有具有氧化铟的沟道层11,包括形成氧化铟膜作为沟道层,并使所形成的氧化铟膜在氧化气氛中进行退火。

    LIGHT EMITTING DEVICE AND METHOD OF PRODUCING LIGHT EMITTING DEVICE
    8.
    发明申请
    LIGHT EMITTING DEVICE AND METHOD OF PRODUCING LIGHT EMITTING DEVICE 有权
    发光装置及其制造发光装置的方法

    公开(公告)号:US20090134427A1

    公开(公告)日:2009-05-28

    申请号:US12162924

    申请日:2007-03-15

    IPC分类号: H01L33/00 H01L21/28

    摘要: There has not been a DC drive type light emitting device capable of providing high brightness. The present invention provides a light emitting device, including: a pair of electrodes; a light emitter placed between the electrodes; and a semiconductor laminated to be adjacent to the light emitter, in which the semiconductor contains one of a chalcopyrite and an oxychalcogenide.

    摘要翻译: 还没有能够提供高亮度的DC驱动型发光装置。 本发明提供一种发光器件,包括:一对电极; 位于电极之间的发光体; 以及与发光体相邻的半导体层叠体,其中半导体含有黄铜矿和氧化硫化物之一。

    Production method of thin film transistor using amorphous oxide semiconductor film
    9.
    发明授权
    Production method of thin film transistor using amorphous oxide semiconductor film 有权
    使用非晶氧化物半导体膜的薄膜晶体管的制造方法

    公开(公告)号:US08415198B2

    公开(公告)日:2013-04-09

    申请号:US12374665

    申请日:2007-07-26

    IPC分类号: H01L21/00

    CPC分类号: H01L29/7869

    摘要: A production method of a thin film transistor including an active layer including an amorphous oxide semiconductor film, wherein a step of forming the active layer includes a first step of forming the oxide film in an atmosphere having an introduced oxygen partial pressure of 1×10−3 Pa or less, and a second step of annealing the oxide film in an oxidative atmosphere after the first step.

    摘要翻译: 1.一种薄膜晶体管的制造方法,其特征在于,具备包含非晶形氧化物半导体膜的有源层的薄膜晶体管,其特征在于,形成有源层的工序包括在引入氧分压为1×10 -5的气氛中形成氧化膜的第1工序, 3Pa以下,以及在第一工序后的氧化性气氛中退火氧化膜的第二工序。

    PRODUCTION METHOD OF THIN FILM TRANSISTOR USING AMORPHOUS OXIDE SEMICONDUCTOR FILM
    10.
    发明申请
    PRODUCTION METHOD OF THIN FILM TRANSISTOR USING AMORPHOUS OXIDE SEMICONDUCTOR FILM 有权
    使用无定形氧化物半导体膜的薄膜晶体管的生产方法

    公开(公告)号:US20090325341A1

    公开(公告)日:2009-12-31

    申请号:US12374665

    申请日:2007-07-26

    IPC分类号: H01L21/336

    CPC分类号: H01L29/7869

    摘要: A production method of a thin film transistor including an active layer including an amorphous oxide semiconductor film, wherein a step of forming the active layer includes a first step of forming the oxide film in an atmosphere having an introduced oxygen partial pressure of 1×10−3 Pa or less, and a second step of annealing the oxide film in an oxidative atmosphere after the first step.

    摘要翻译: 一种薄膜晶体管的制造方法,其特征在于,具备包含非晶形氧化物半导体膜的活性层的薄膜晶体管,其特征在于,形成有源层的工序包括在导入氧分压为1×10 -3 Pa的气氛中形成氧化膜的第1工序 以及在第一工序后的氧化性气氛中退火氧化膜的第二工序。