公开(公告)号：US20210293618A1

公开(公告)日：2021-09-23

申请号：US17263147

申请日：2019-07-25

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Yonatan OREN

IPC: G01J3/02 ,  G01J3/06 ,  G01J3/44 ,  G01J3/28 ,  G01J3/10

Abstract: A polarized Raman Spectrometric system for defining parameters of a polycrystaline material, the system comprises a polarized Raman Spectrometric apparatus, a computer-controlled sample stage for positioning a sample at different locations, and a computer comprising a processor and an associated memory. The polarized Raman Spectrometric apparatus generates signal(s) from either small sized spots at multiple locations on a sample or from an elongated line-shaped points on the sample, and the processor analyzes the signal(s) to define the parameters of said polycrystalline material.

公开(公告)号：US20210223179A1

公开(公告)日：2021-07-22

申请号：US17020587

申请日：2020-09-14

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Eyal Hollander ,  Gilad Barak ,  Elad Schleifer ,  Yonatan OREN ,  Amir Shayari

IPC: G01N21/65

Abstract: A method, a system, and a non-transitory computer readable medium for Raman spectroscopy. The method may include determining first acquisition parameters of a Raman spectroscope to provide a first acquisition set-up, the determining is based on at least one expected radiation pattern to be detected by a sensor of the Raman spectroscope as a result of an illumination of a first area of a sample, the first area comprises a first nano-scale structure, wherein at least a part of the at least one expected radiation pattern is indicative of at least one property of interest of the first nano-scale structure of the sample; wherein the first acquisition parameters belong to a group of acquisition parameters; setting the Raman spectroscope according to the first acquisition set-up; and acquiring at least one first Raman spectrum of the first nano-scale structure of the sample, while being set according to the first acquisition set-up

公开(公告)号：US20210164906A1

公开(公告)日：2021-06-03

申请号：US16613448

申请日：2018-05-15

Applicant: NOVA MEASURING INSTRUMENTS LTD

Inventor： Yonatan OREN

IPC: G01N21/65 ,  G01N21/95 ,  G03F7/20

Abstract: A method and system are presented for use in measuring one or more characteristics of patterned structures. The method comprises: performing measurements on a patterned structure by illuminating the structure with exciting light to cause Raman scattering of one or more excited regions of the pattern structure, while applying a controlled change of at least temperature condition of the patterned structure, and detecting the Raman scattering, and generating corresponding measured data indicative of a temperature dependence of the detected Raman scattering; and analyzing the measured data and generating data indicative of spatial profile of one or more properties of the patterned structure.