公开(公告)号：US09915624B2

公开(公告)日：2018-03-13

申请号：US15385495

申请日：2016-12-20

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Igor Turovets ,  Cornel Bozdog ,  Dario Elyasi

IPC: G01N21/00 ,  G01N21/95 ,  G01N21/47 ,  G01B11/24 ,  G01B11/06

CPC classification number: G01N21/9501 ,  G01B11/06 ,  G01B11/24 ,  G01B2210/56 ,  G01N21/47 ,  G01N21/8903 ,  G01N2201/12

Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.

公开(公告)号：US09528946B2

公开(公告)日：2016-12-27

申请号：US14422190

申请日：2013-08-15

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Igor Turovets ,  Cornel Bozdog ,  Dario Elyasi

IPC: G01N21/00 ,  G01N21/95 ,  G01B11/24 ,  G01N21/47 ,  G01N21/89

CPC classification number: G01N21/9501 ,  G01B11/06 ,  G01B11/24 ,  G01B2210/56 ,  G01N21/47 ,  G01N21/8903 ,  G01N2201/12

Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.

Abstract translation: 提出了一种方法和系统，用于控制应用于具有不同层叠叠层区域的图案化结构的工艺。 该方法包括：在预定处理时间内顺序地接收指示正在处理的结构的光学响应的​​测量数据，并产生随时间测量的相应的数据片段序列; 以及分析和处理所述数据段的序列并确定所述结构的至少一个主要参数。 分析和处理包括：处理所述数据片段的一部分并获得指示所述结构的一个或多个参数的数据; 利用表示所述结构的所述一个或多个参数的所述数据，以及描述所述结构的光学响应与所述结构的一个或多个参数之间的关系的最优化模型数据; 利用优化的模型数据来处理测量数据段的序列的至少一部分，以及确定表征应用于结构的所述过程的结构的至少一个参数，以及生成指示其的数据。

公开(公告)号：US10226852B2

公开(公告)日：2019-03-12

申请号：US15108855

申请日：2014-07-31

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Igor Turovets

IPC: B24B37/20 ,  H01L21/321 ,  H01L21/67 ,  B24B37/015 ,  B24B37/04 ,  H01L21/268 ,  H01L21/3105 ,  H01L21/311 ,  H01L21/66

Abstract: A surface planarization system is presented. The system comprises an external energy source for generating a localized energy distribution within a processing region, and a control unit for operating the external energy source to create, by the localized energy distribution, a predetermined temperature pattern within the processing region such that different locations of the processing region are subjected to different temperatures. This provides that when a sample (e.g. semiconductor wafer) during its interaction with an etching material composition is located in the processing region, the temperature pattern at different locations of the sample's surface creates different material removal rates by the etching material composition (different etch rates).

公开(公告)号：US10216098B2

公开(公告)日：2019-02-26

申请号：US15534187

申请日：2015-12-10

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Oded Cohen ,  Gilad Barak ,  Igor Turovets

IPC: G03F7/20 ,  H01L21/66

Abstract: A test structure and method of its manufacture are presented for use in metrology measurements of a sample pattern. The test structure comprises a test pattern comprising a portion of the sample pattern including at least one selected feature and a blocking layer at least partially covering regions of the test structure adjacent to the at least one selected region.

公开(公告)号：US10197506B2

公开(公告)日：2019-02-05

申请号：US15915613

申请日：2018-03-08

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Igor Turovets ,  Cornel Bozdog ,  Dario Elyasi

IPC: G01N21/00 ,  G01N21/95 ,  G01B11/24 ,  G01N21/47 ,  G01N21/89 ,  G01B11/06

Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.

公开(公告)号：US10978321B2

公开(公告)日：2021-04-13

申请号：US16067202

申请日：2016-12-29

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Igor Turovets

IPC: H01L21/67 ,  H01L21/3105 ,  H01L21/321 ,  H01L21/66

Abstract: A system and method are presented for controlling a process applied to a structure comprising at least one of material removal and material deposition processes. The system comprises: a heating radiation source configured and operable to generate a temperature field profile across a processing area of the structure; and a control unit configured and operable to control operation of said heating radiation source in accordance with a predetermined pattern map within the processing area, so as to create a corresponding pattern selective profile of said temperature field across said processing area providing desired pattern selective distribution of at least one parameter characterizing the process applied to the processing area of the structure.

公开(公告)号：US10066936B2

公开(公告)日：2018-09-04

申请号：US15124445

申请日：2015-03-10

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Igor Turovets

IPC: G01B11/02 ,  G01B11/27 ,  H01L21/66 ,  G01N21/47 ,  G01N21/956 ,  G01N21/95 ,  H01L21/033

Abstract: An article is presented configured for controlling a multiple patterning process, such as a spacer self-aligned multiple patterning, to produce a target pattern. The article comprises a test site carrying a test structure comprising at least one pair of gratings, wherein first and second gratings of the pair are in the form of first and second patterns of alternating features and spaces and differ from the target pattern by respectively different first and second values which are selected to provide together a total difference such that a differential optical response from the test structure is indicative of a pitch walking effect.

公开(公告)号：US20150226680A1

公开(公告)日：2015-08-13

申请号：US14422190

申请日：2013-08-15

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Igor Turovets ,  Cornel Bozdog ,  Dario Elyasi

IPC: G01N21/95 ,  G01N21/89 ,  G01N21/47

CPC classification number: G01N21/9501 ,  G01B11/06 ,  G01B11/24 ,  G01B2210/56 ,  G01N21/47 ,  G01N21/8903 ,  G01N2201/12

Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.

Abstract translation: 提出了一种方法和系统，用于控制应用于具有不同层叠叠层区域的图案化结构的工艺。 该方法包括：在预定处理时间内顺序地接收指示正在处理的结构的光学响应的​​测量数据，并产生随时间测量的相应的数据片段序列; 以及分析和处理所述数据段的序列并确定所述结构的至少一个主要参数。 分析和处理包括：处理所述数据片段的一部分并获得指示所述结构的一个或多个参数的数据; 利用表示所述结构的所述一个或多个参数的所述数据，以及描述所述结构的光学响应与所述结构的一个或多个参数之间的关系的最优化模型数据; 利用优化的模型数据来处理测量数据段的序列的至少一部分，以及确定表征应用于结构的所述过程的结构的至少一个参数，以及生成表示其的数据。