公开(公告)号：US20220141946A1

公开(公告)日：2022-05-05

申请号：US17435665

申请日：2019-03-01

Applicant: NATIONAL UNIVERSITY CORPORATION KANAZAWA UNIVERSITY ,  NISSHIN SEIFUN GROUP INC.

Inventor： Yasunori TANAKA ,  Naoto KODAMA ,  Kazuki ONDA ,  Shu WATANABE ,  Keitaroh NAKAMURA ,  Shiori SUEYASU ,  Tomoya WATANABE

IPC: H05H1/30 ,  B01J19/08 ,  C01B33/021

Abstract: A fine particle manufacturing apparatus and a fine particle manufacturing method are provided. The apparatus includes a raw material supply part supplying a raw material; a plasma torch in which the thermal plasma flame is generated and the raw material supplied by the raw material supply part is vaporized by using the thermal plasma flame to form a mixture in a gas phase state; and a plasma generation part generating the thermal plasma flame inside the plasma torch. The plasma generation part includes a first coil encircling the plasma torch; a second coil encircling the plasma torch and disposed below the first coil; a first power supply part supplying a high-frequency electric current to the first coil; and a second power supply part supplying an amplitude-modulated high-frequency electric current to the second coil. The first coil and the second coil are arranged in the longitudinal direction of the plasma torch.

公开(公告)号：US20250026648A1

公开(公告)日：2025-01-23

申请号：US18714877

申请日：2022-11-16

Applicant: NISSHIN SEIFUN GROUP INC.

Inventor： Yasunori TANAKA ,  Ryudai FURUKAWA ,  Yurina NAGASE ,  Shu WATANABE ,  Shiori SUEYASU ,  Keitaro NAKAMURA

IPC: C01B33/02 ,  B01J19/08 ,  C01B33/113 ,  H01L31/0224 ,  H01L33/40 ,  H01M4/02 ,  H01M4/36 ,  H01M4/38 ,  H01M4/48

Abstract: Provided is a composition containing nanoparticles, nanorods, and nanowires that do not essentially require a carrier such as a substrate. The composition contains nanoparticles, nanorods, and nanowires, and the nanoparticles, the nanorods, and the nanowires are each formed of at least one of Si or SiO.

公开(公告)号：US20220219236A1

公开(公告)日：2022-07-14

申请号：US17615775

申请日：2020-06-04

Applicant: NATIONAL UNIVERSITY CORPORATION KANAZAWA UNIVERSITY ,  NISSHIN SEIFUN GROUP INC.

Inventor： Yasunori TANAKA ,  Naoto KODAMA ,  Kazuki ONDA ,  Shu WATANABE ,  Keitaro NAKAMURA ,  Shiori SUEYASU

IPC: B22F9/14 ,  B22F9/12 ,  H05H1/42

Abstract: Provided are a fine particle production apparatus and a fine particle production method that can control the particle sizes of fine particles, and efficiently produce a large amount of fine particles having good particle size uniformity. The present invention comprises: a raw material supply unit which supplies raw materials for fine particle production into thermal plasma flame; a plasma torch in which the thermal plasma flame is generated, and which evaporates the raw material supplied by the raw material supply unit by means of the thermal plasma flame to form a mixture in a gas phase state; and a plasma generation unit which generates thermal plasma flame inside the plasma torch. The plasma generation unit includes: a first coil which surrounds the plasma torch, a second coil which is installed below the first coil in the longitudinal direction of the plasma torch and surrounds the circumference of the plasma torch; a first power supply unit which supplies an amplitude-modulated first high-frequency current to the first coil; and a second power supply unit which supplies an amplitude-modulated second high-frequency current to the second coil. The degree of modulation of the first high-frequency current is smaller than the degree of modulation of the second high-frequency current.

公开(公告)号：US20210316268A1

公开(公告)日：2021-10-14

申请号：US17272882

申请日：2019-09-02

Applicant: NATIONAL UNIVERSITY CORPORATION KANAZAWA UNIVERSITY ,  NISSHIN SEIFUN GROUP INC.

Inventor： Yasunori TANAKA ,  Kotaro SHIMIZU ,  Shiori SUEYASU ,  Shu WATANABE ,  Tomoya WATANABE ,  Keitaro NAKAMURA

IPC: B01J19/08 ,  C01B33/027 ,  H05H1/30 ,  B01J2/04 ,  B22F9/14

Abstract: Provided are a fine particle manufacturing apparatus and a fine particle manufacturing method, which manufacture smaller fine particles. The fine particle manufacturing apparatus has: a raw material supply unit that supplies raw materials for producing fine particles into a thermal plasma flame; a plasma torch in which the thermal plasma flame is generated and the raw materials supplied by the raw material supply unit is evaporated by the thermal plasma flame to form a mixture in a gaseous state; a plasma generation unit that generates the thermal plasma flame inside the plasma torch; and a gas supply unit that supplies quenched gas to the thermal plasma flame, wherein the gas supply unit supplies the quenched gas with time modulation of the supply amount of the quenched gas.

公开(公告)号：US20250033980A1

公开(公告)日：2025-01-30

申请号：US18714943

申请日：2022-11-16

Applicant: NISSHIN SEIFUN GROUP INC.

Inventor： Yasunori TANAKA ,  Ryudai FURUKAWA ,  Yurina NAGASE ,  Shu WATANABE ,  Shiori SUEYASU ,  Keitaro NAKAMURA

IPC: C01B33/113 ,  B82Y30/00

Abstract: Provided is a composition containing only nanowires that do not essentially require a carrier such as a substrate. The composition contains only nanowires, and the nanowires have a diameter of not less than 1 nm and less than 40 nm and are formed of at least one of Si or SiO. The nanowires preferably have a length of at least three times the diameter. The nanowires do not essentially require a carrier such as a substrate.

公开(公告)号：US20210061665A1

公开(公告)日：2021-03-04

申请号：US17054390

申请日：2019-05-08

Applicant: NISSHIN SEIFUN GROUP INC.

Inventor： Yasunori TANAKA ,  Naoto KODAMA ,  Yousuke ISHISAKA ,  Shu WATANABE ,  Keitaro NAKAMURA ,  Shiori SUEYASU

IPC: C01B33/03 ,  B01J19/08 ,  B22F9/14 ,  H05H1/30

Abstract: Provided are a method and apparatus capable of producing fine particles with favorable particle size distribution. In a production method in which feedstock for fine particle production is supplied intermittently into a modulated induction thermal plasma flame, the feedstock is vaporized to form a gas phase mixture, and the mixture is cooled to produce the fine particles: a modulated induction thermal plasma flame in which the temperature state is time-modulated is generated; the modulated induction thermal plasma flame is switched between a high temperature state and a low temperature state; and when the modulated induction thermal plasma flame is in the high temperature state, the feedstock is supplied together with a carrier gas, and when the modulated induction thermal plasma flame is in the low temperature state, supply of the feedstock is suspended and a gas of the same type as the carrier gas is supplied.