公开(公告)号：US20200300930A1

公开(公告)日：2020-09-24

申请号：US16770631

申请日：2018-11-26

Applicant: NIDEC READ CORPORATION

Inventor： Masami YAMAMOTO ,  Kazuhiko KITANO ,  Norihiro OTA ,  Shigeki SAKAI ,  Kiyoshi NUMATA

IPC: G01R33/02 ,  H01L43/12 ,  H01F41/04

Abstract: A method for producing an MI element includes: an insulation step of forming an insulator layer on an outer periphery of an amorphous wire; an electroless plating step of forming an electroless plating layer on an outer peripheral surface of the insulator layer; an electrolytic plating step of forming an electrolytic plating layer on an outer peripheral surface of the electroless plating layer; a resist step of forming a resist layer on an outer peripheral surface of the electrolytic plating layer; an exposure step of exposing the resist layer with a laser to form a spiral groove strip on an outer peripheral surface of the resist layer; an etching step of performing etching using the resist layer as a masking material and removing the electroless plating layer and the electrolytic plating layer in the groove strip to form a coil with the remaining electroless plating layer and electrolytic plating layer.