SEMICONDUCTOR COMPRISING REDISTRIBUTION STRUCTURE, AND METHOD FOR MANUFACTURING THE SAME

    公开(公告)号:US20230128862A1

    公开(公告)日:2023-04-27

    申请号:US17938672

    申请日:2022-10-06

    申请人: NEPES CO., LTD.

    摘要: Provided is a semiconductor package including a redistribution structure including at least one redistribution insulating layer and at least one redistribution pattern, at least one semiconductor chip located on the redistribution structure, and a molding layer located on the redistribution structure and covering the at least one semiconductor chip. The redistribution pattern includes a redistribution via passing through the redistribution insulating layer and extending in a first direction perpendicular to a top surface of the redistribution structure, and a redistribution line extending in a second direction parallel to the top surface of the redistribution structure. Inner side walls of the redistribution via have a certain inclination, and a difference between a thickness of a central portion of the redistribution line and a thickness of an edge of the redistribution line ranges from 1% to 10% of the thickness of the central portion of the redistribution line.