公开(公告)号：US12019032B2

公开(公告)日：2024-06-25

申请号：US17113510

申请日：2020-12-07

Applicant: NANYA TECHNOLOGY CORPORATION

Inventor： Hung-Chih Chang ,  Chug-Chi Chu ,  Chi-Min Tu ,  Wun-Ye Ku

IPC: G01N21/95 ,  G03F7/039

CPC classification number: G01N21/9505 ,  G03F7/0392 ,  G01N21/9503

Abstract: The present disclosure provides an electronic system with defect identification function and a method of qualifying a photoresist pattern formed using a lithography process. The electronic system includes an inspection apparatus and a processor associated with the inspection apparatus. The inspection apparatus is used for acquiring at least one image of the specimen on which a photoresist pattern is formed using a lithography process. The processor is configured to automatically apply machine learning processes implemented through one or more neural networks to identify at least one defect present in the photoresist pattern.