DEGRADABLE HAEMOSTAT COMPOSITION
    1.
    发明申请

    公开(公告)号:US20170258959A1

    公开(公告)日:2017-09-14

    申请号:US15600906

    申请日:2017-05-22

    摘要: In one aspect, the present invention includes a haemostat composition that includes a chitosan, chitosan salt or chitosan derivative, and a physiologically acceptable acid selected from the group consisting of lactic acid, formic acid, acetic acid, ascorbic acid, halogen acetic acids, propanoic acid, propenoic acid, acrylic acid, glyoxylic acid, pyruvic acid or a hydroxy propionic/butanoic acid, and combinations of any two or more thereof; or one or more acids selected from hydrochloric acid and sulphuric acid. The haemostat composition is able to safely gradually and fully degrade in a human or animal body within about 30 days and so can be utilised by physicians to stem a flow of blood and promote healing both after as well as during surgical procedures.

    Process for producing low endotoxin chitosan

    公开(公告)号:US11534525B2

    公开(公告)日:2022-12-27

    申请号:US14894473

    申请日:2014-05-29

    摘要: The present invention relates to a process for producing a low endotoxin alkali chitosan, chitin, chitosan derivative or chitin derivative, and also to a process for producing low endotoxin neutral chitosan, chitosan salt and chitosan derivatives, and to the products of such processes. The process comprises contacting chitosan, chitin, chitosan derivative or chitin derivative with an alkali solution having a concentration of less than 0.25M to form a mixture; leaving the mixture for a period of less than 12 hours and optionally drying the mixture. The low endotoxin alkali chitosan may be used in the manufacture of other useful chitosan based products.

    Process for producing low endotoxin chitosan

    公开(公告)号:US11498981B2

    公开(公告)日:2022-11-15

    申请号:US15052016

    申请日:2016-02-24

    IPC分类号: C08B37/08 A61L26/00 C08L5/08

    摘要: The present invention relates to a process for producing a low endotoxin alkali chitosan, and also to a process for producing low endotoxin neutral chitosan, chitosan salt and chitosan derivatives, and to the products of such processes. The process comprises contacting chitosan with an alkali solution to form a mixture and leaving the mixture for at least about 12 hours. The low endotoxin alkali chitosan may be used the manufacture of other useful chitosan based products.

    Composition for a wound dressing
    7.
    发明授权

    公开(公告)号:US10561533B2

    公开(公告)日:2020-02-18

    申请号:US15546644

    申请日:2016-01-27

    IPC分类号: A61F13/00 A61L15/46 A61L15/20

    摘要: The present invention relates to a composition that can be used as or as part of a wound dressing and to wound dressings comprising the same. More specifically, the present invention relates to a composition that disrupts and kills bacteria within a biofilm and also prevents biofilm formation. The composition comprises a first component selected from the group consisting of chitosan, chitin, derivatives of chitosan, derivatives of chitin, and combinations thereof; at least one triprotic acid and at least one solubilising acid.

    WOUND DRESSING
    9.
    发明申请
    WOUND DRESSING 审中-公开

    公开(公告)号:US20180125721A1

    公开(公告)日:2018-05-10

    申请号:US15569723

    申请日:2016-04-25

    IPC分类号: A61F13/02 A61F13/00

    摘要: The present invention relates to a wound dressing composition for use as or in a wound dressing and to methods of making the wound dressing composition. The wound dressing composition comprises an absorbent material, an adhesive material and an anchor material attached to the absorbent material and the adhesive material. The anchor material is operable to maintain a link between the absorbent material and the adhesive material when the wound dressing composition is wet.

    Process for producing low endotoxin chitosan

    公开(公告)号:US11485798B2

    公开(公告)日:2022-11-01

    申请号:US14387331

    申请日:2013-03-25

    摘要: The present invention relates to a process for producing a low endotoxin alkali chitosan, and also to a process for producing low endotoxin neutral chitosan, chitosan salt and chitosan derivatives, and to the products of such processes. The process comprises contacting chitosan with an alkali solution to form a mixture and leaving the mixture for at least about 12 hours. The low endotoxin alkali chitosan may be used in the manufacture of other useful chitosan based products.