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1.发明授权Method for producing a mask for the lithographic projection of a pattern onto a substrate 失效用于制造用于将图案的光刻投影到基板上的掩模的方法公开(公告)号：US07644389B2
公开(公告)日：2010-01-05
申请号：US11668565
申请日：2007-01-30
申请人： Mario Hennig , Rainer Pforr , Gerd Unger
发明人： Mario Hennig , Rainer Pforr , Gerd Unger
CPC分类号： G03F7/70191 , G03F1/00
摘要： A layout is decomposed into partial patterns. An intermediate mask is drawn for each of the partial patterns. The intermediate masks are used in a mask stepper or scanner progressively for projection again into a common pattern on a test mask. A line width distribution LB(x,y) is determined from the test mask or from a test wafer exposed using the mask, and is converted into a distribution of dose corrections. The transmission T(x,y) of the respective intermediate masks is adapted based upon the calculated dose correction. This can be achieved using additional optical elements which are assigned to the intermediate masks and have shading structure elements, or by laser-induced rear-side introduction of shading elements in the quartz substrate of the intermediate masks themselves.
摘要翻译： 布局被分解为部分图案。 为每个部分图案绘制中间掩模。 中间掩模在掩模步进器或扫描仪中逐渐用于投影到测试掩模上的共同图案中。 从测试掩模或使用掩模曝光的测试晶片确定线宽度分布LB（x，y），并将其转换成剂量校正的分布。 基于所计算的剂量校正来适应各个中间掩模的传输T（x，y）。 这可以使用分配给中间掩模并具有阴影结构元件的附加光学元件，或者通过激光引起的中间掩模本身的石英衬底中的遮光元件的后侧引入来实现。
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2.发明申请METHOD FOR PRODUCING A MASK FOR THE LITHOGRAPHIC PROJECTION OF A PATTERN ONTO A SUBSTRATE 失效用于生成用于将图案投影到基板上的掩模的掩模的方法公开(公告)号：US20070196744A1
公开(公告)日：2007-08-23
申请号：US11668565
申请日：2007-01-30
申请人： Mario Hennig , Rainer Pforr , Gerd Unger
发明人： Mario Hennig , Rainer Pforr , Gerd Unger
CPC分类号： G03F7/70191 , G03F1/00
摘要： A layout is decomposed into partial patterns. An intermediate mask is drawn for each of the partial patterns. The intermediate masks are used in a mask stepper or scanner progressively for projection again into a common pattern on a test mask. A line width distribution LB(x,y) is determined from the test mask or from a test wafer exposed using the mask, and is converted into a distribution of dose corrections. The transmission T(x,y) of the respective intermediate masks is adapted based upon the calculated dose correction. This can be achieved using additional optical elements which are assigned to the intermediate masks and have shading structure elements, or by laser-induced rear-side introduction of shading elements in the quartz substrate of the intermediate masks themselves.
摘要翻译： 布局被分解为部分图案。 为每个部分图案绘制中间掩模。 中间掩模在掩模步进器或扫描仪中逐渐用于投影到测试掩模上的共同图案中。 从测试掩模或使用掩模曝光的测试晶片确定线宽度分布LB（x，y），并将其转换成剂量校正的分布。 基于所计算的剂量校正来适应各个中间掩模的传输T（x，y）。 这可以使用分配给中间掩模并具有阴影结构元件的附加光学元件，或者通过激光引起的中间掩模本身的石英衬底中的遮光元件的后侧引入来实现。
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公开(公告)号：US06972832B1
公开(公告)日：2005-12-06
申请号：US09660899
申请日：2000-09-13
申请人： Gernot Gödl , Andreas Oelmann , Gerd Unger , Wolfgang Besenböck , Alois Reiter
发明人： Gernot Gödl , Andreas Oelmann , Gerd Unger , Wolfgang Besenböck , Alois Reiter
CPC分类号： G03F1/78 , G03F1/40 , H01J2237/004 , H01J2237/3175
摘要： A retaining device for photo blanks, comprising a retaining member (1) with a supporting surface (3) for a photo blank (4) and a ground element (10) which can be brought into contact with an electroconductive layer (6) of said photo blank. The ground element is provided with a contact tip (15) which can be manipulated in such a way that it can be lowered substantially onto the photo blank (4) without any lateral movement in relation to said photo blank which is inserted into the retaining device.
摘要翻译： 一种用于照片坯料的保持装置，包括具有用于光致抗蚀剂（4）的支撑表面（3）的保持构件（1）和能够与所述电路板的导电层（6）接触的接地元件（10） 照片空白 接地元件设置有接触尖端（15），其可以以这样的方式操作，使得其可以基本上降低到照片坯料（4）上，而不会相对于插入保持装置中的所述照片坯料的任何横向移动 。
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