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    Heat mode sensitive imaging element for making positive working printing plates
    3.
    发明授权
    Heat mode sensitive imaging element for making positive working printing plates 有权
    加热模式敏感成像元件，用于制作正性印刷版

    公开(公告)号：US06489079B1

    公开(公告)日：2002-12-03

    申请号：US09391421

    申请日：1999-09-08

    申请人： Eric Verschueren ,  Joan Vermeersch ,  Marc Van Damme ,  Guido Hauquier ,  Huub Van Aert

    发明人： Eric Verschueren ,  Joan Vermeersch ,  Marc Van Damme ,  Guido Hauquier ,  Huub Van Aert

    IPC分类号： G03F7004

    CPC分类号： B41C1/1025 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/24 ,  B41N1/083 ,  Y10S430/165

    摘要： According to the present invention there is provided a heat mode imaging element for making a lithographic printing plate comprising on a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer which top layer is IR-sensitive and unpenetrable for an alkaline developer wherein said first layer and said top layer may be one and the same layer; characterized in that said top layer contains at least one blockcopolymer in an amount between 0.5 and 500 mg/m2.

    摘要翻译： 根据本发明，提供一种用于制造平版印刷版的热模式成像元件，该平版印刷版包括在具有亲水表面的平版印刷基底上，第一层包括可溶于碱性水溶液的聚合物和位于同一侧上的顶层 作为第一层的光刻基底，其顶层对于碱性显影剂是IR敏感的和不可穿透的，其中所述第一层和所述顶层可以是同一层; 其特征在于所述顶层含有至少一种0.5-500mg / m 2的嵌段共聚物。

    Heat-sensitive lithographic printing plate precursor
    4.
    发明授权
    Heat-sensitive lithographic printing plate precursor 失效
    热敏平版印刷版前体

    公开(公告)号：US07205084B2

    公开(公告)日：2007-04-17

    申请号：US10834555

    申请日：2004-04-29

    申请人： Marc Van Damme ,  Huub Van Aert

    发明人： Marc Van Damme ,  Huub Van Aert

    IPC分类号： G03F7/11 ,  G03F7/30

    CPC分类号： B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/145

    摘要： A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating thereon which comprises an infrared light-to-heat converter, an alkali-soluble binder and a polymeric developer accelerator. The polymeric developer accelerator is preferably a phenolic formaldehyde resin comprising at least 70 mol % of meta-cresol as recurring unit or at least 40 mol % of monohydroxy benzene cresol as recurring unit. The PDA may also be a phenolic resin which comprises at least 5 mol % of a recurring monomeric unit having at least one phenolic hydroxyl group and at least one alkali solubilising group. The polymeric developer accelerator improves the sensitivity while maintaining a good under-exposure latitude and a good developer resistance of the printing plate.

    摘要翻译： 公开了一种热敏平版印刷版原版，其包含亲水载体和其上的亲油性涂层，其包含红外光热转换器，碱溶性粘合剂和聚合显影剂促进剂。 聚合显影剂促进剂优选为包含至少70mol％的间甲酚作为重复单元或至少40mol％的单羟基苯甲酚作为重复单元的酚醛树脂。 PDA还可以是酚醛树脂，其包含至少5摩尔％的具有至少一个酚羟基的重复单体单元和至少一个碱增溶基团。 聚合物显影剂促进剂在保持良好的低曝光宽容度和印刷版的良好显影剂抗性的同时提高了灵敏度。

    Heat-sensitive lithographic printing plate precursor
    5.
    发明申请
    Heat-sensitive lithographic printing plate precursor 有权
    热敏平版印刷版前体

    公开(公告)号：US20050136355A1

    公开(公告)日：2005-06-23

    申请号：US10834553

    申请日：2004-04-29

    申请人： Huub Van Aert ,  Bert Groenendaal ,  Marc Van Damme

    发明人： Huub Van Aert ,  Bert Groenendaal ,  Marc Van Damme

    IPC分类号： B41C1/10 ,  G03C1/492

    CPC分类号： B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/145

    摘要： According to the present invention there is provided a positive-working lithographic printing plate precursor which comprises on a support having a hydrophilic surface or which is provided with a hydrophilic layer, an oleophilic coating comprising an infrared absorbing agent, an alkali-soluble polymeric binder and a polysiloxane which comprises at least one carboxylic acid group or a salt thereof. The disclosed printing plate precursor has an improved sensitivity and at the same time a high under exposure latitude and a high developer resistance.

    摘要翻译： 根据本发明，提供了一种正性平版印刷版原版，其包含在具有亲水性表面或具有亲水层的支持体上，亲水性涂层包含红外线吸收剂，碱溶性聚合物粘合剂和 包含至少一个羧酸基团或其盐的聚硅氧烷。 所公开的印版前体具有改进的灵敏度，同时高曝光宽度和高显影剂阻力。

    Heat-sensitive lithographic printing plate precursor
    6.
    发明申请
    Heat-sensitive lithographic printing plate precursor 失效
    热敏平版印刷版前体

    公开(公告)号：US20050037280A1

    公开(公告)日：2005-02-17

    申请号：US10916154

    申请日：2004-08-11

    申请人： Johan Loccufier ,  Bert Groenedaal ,  Marc Van Damme ,  Huub Van Aert

    发明人： Johan Loccufier ,  Bert Groenedaal ,  Marc Van Damme ,  Huub Van Aert

    IPC分类号： B41C1/10 ,  G03C1/76

    CPC分类号： B41C1/1008 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/145

    摘要： A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating comprising an infrared absorbing agent and a developer soluble polymer which comprises a phenolic monomeric unit wherein the phenyl group of the phenolic monomeric unit is substituted by a group Q, wherein Q has the structure and is covalently linked to a carbon atom of the phenyl group and wherein L1, L2 and L3 are linking groups, a, b and c are 0 or 1, and T1, T2 and T3 are terminal groups. The polymer, substituted by the group Q, increases the chemical resistance of the coating.

    摘要翻译： 公开了一种热敏平版印刷版前体，其包含亲水性载体和亲油性涂层，其包含红外吸收剂和显影剂可溶性聚合物，其包含酚单体单元，其中酚单体单元的苯基被基团Q 其中Q具有结构并共价连接到苯基的碳原子，其中L 1，L 2和L 3是连接基团，a，b和c分别是0或1，T <1>，T 2和T 3是末端基团。 由Q组取代的聚合物增加了涂层的耐化学性。

    Processless lithographic printing plate
    7.
    发明授权
    Processless lithographic printing plate 失效
    无处理平版印刷版

    公开(公告)号：US06790595B2

    公开(公告)日：2004-09-14

    申请号：US10002944

    申请日：2001-11-02

    申请人： Marc Van Damme ,  Wim Sap ,  Huub Van Aert

    发明人： Marc Van Damme ,  Wim Sap ,  Huub Van Aert

    IPC分类号： G03F711

    CPC分类号： B41C1/1041 ,  Y10S430/145 ,  Y10S430/146

    摘要： A negative-working heat-sensitive material for making a lithographic printing plate by direct-to-plate recording is disclosed. The material comprises in the order given a lithographic base having a hydrophilic surface, an oleophilic imaging layer and a cross-linked hydrophilic upper layer which comprises an organic compound derived from sulfonic acid, sulfuric acid, phosphoric acid or phosphonic acid. Materials according to the invention are characterized by an increased water-acceptance in the non-printing areas, which allows a rapid start-up of the press.

    摘要翻译： 公开了一种用于通过直接到板记录制造平版印刷版的负性热敏材料。 该材料按顺序给出具有亲水表面的光刻基底，亲油成像层和交联的亲水性上层，其包含衍生自磺酸，硫酸，磷酸或膦酸的有机化合物。 根据本发明的材料的特征在于在非印刷区域中增加的水接受性，这允许压机的快速启动。

    Heat-sensitive lithographic printing plate precursor
    10.
    发明授权
    Heat-sensitive lithographic printing plate precursor 失效
    热敏平版印刷版前体

    公开(公告)号：US07425402B2

    公开(公告)日：2008-09-16

    申请号：US10916154

    申请日：2004-08-11

    申请人： Johan Loccufier ,  Bert Groenendaal ,  Marc Van Damme ,  Huub Van Aert

    发明人： Johan Loccufier ,  Bert Groenendaal ,  Marc Van Damme ,  Huub Van Aert

    IPC分类号： G03C1/77 ,  G03F7/09 ,  G03F7/038 ,  G03F7/039

    CPC分类号： B41C1/1008 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/145

    摘要： A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating comprising an infrared absorbing agent and a developer soluble polymer which comprises a phenolic monomeric unit wherein the phenyl group of the phenolic monomeric unit is substituted by a group Q, wherein Q has the structure and is covalently linked to a carbon atom of the phenyl group and wherein L1, L2 and L3 are linking groups, a, b and c are 0 or 1, and T1, T2 and T3 are terminal groups. The polymer, substituted by the group Q, increases the chemical resistance of the coating.

    摘要翻译： 公开了一种热敏平版印刷版前体，其包含亲水性载体和亲油性涂层，其包含红外吸收剂和显影剂可溶性聚合物，其包含酚单体单元，其中酚单体单元的苯基被基团Q 其中Q具有结构并共价连接到苯基的碳原子上，其中L 1，L 2和L 3 3是 连接基团a，b和c分别是0或1，T 1，T 2和T 3是末端基团。 由Q组取代的聚合物增加了涂层的耐化学性。