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公开(公告)号：US07455949B2
公开(公告)日：2008-11-25
申请号：US10531629
申请日：2003-09-25
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , C08G8/28 , C08L61/14
摘要： A polymer for a heat-sensitive lithographic printing plate precursor is disclosed wherein the polymer comprises a phenolic monomeric unit of which the phenyl group is substituted by a group A characterised in that the group A comprises an imide or thioimide group and wherein the modification of the polymer increases the chemical resistance of the coating of the printing plate precursor.
摘要翻译： 公开了一种用于热敏平版印刷版前体的聚合物，其中所述聚合物包含酚基单体，其中苯基被基团A所取代，其特征在于基团A包含酰亚胺或硫代酰亚胺基，并且其中 聚合物增加了印版前体的涂层的耐化学性。
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公开(公告)号：US20050136355A1
公开(公告)日：2005-06-23
申请号：US10834553
申请日：2004-04-29
申请人： Huub Van Aert , Bert Groenendaal , Marc Van Damme
发明人： Huub Van Aert , Bert Groenendaal , Marc Van Damme
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , Y10S430/145
摘要： According to the present invention there is provided a positive-working lithographic printing plate precursor which comprises on a support having a hydrophilic surface or which is provided with a hydrophilic layer, an oleophilic coating comprising an infrared absorbing agent, an alkali-soluble polymeric binder and a polysiloxane which comprises at least one carboxylic acid group or a salt thereof. The disclosed printing plate precursor has an improved sensitivity and at the same time a high under exposure latitude and a high developer resistance.
摘要翻译： 根据本发明，提供了一种正性平版印刷版原版，其包含在具有亲水性表面或具有亲水层的支持体上，亲水性涂层包含红外线吸收剂，碱溶性聚合物粘合剂和 包含至少一个羧酸基团或其盐的聚硅氧烷。 所公开的印版前体具有改进的灵敏度，同时高曝光宽度和高显影剂阻力。
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公开(公告)号：US07425402B2
公开(公告)日：2008-09-16
申请号：US10916154
申请日：2004-08-11
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , Y10S430/145
摘要： A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating comprising an infrared absorbing agent and a developer soluble polymer which comprises a phenolic monomeric unit wherein the phenyl group of the phenolic monomeric unit is substituted by a group Q, wherein Q has the structure and is covalently linked to a carbon atom of the phenyl group and wherein L1, L2 and L3 are linking groups, a, b and c are 0 or 1, and T1, T2 and T3 are terminal groups. The polymer, substituted by the group Q, increases the chemical resistance of the coating.
摘要翻译： 公开了一种热敏平版印刷版前体，其包含亲水性载体和亲油性涂层，其包含红外吸收剂和显影剂可溶性聚合物，其包含酚单体单元，其中酚单体单元的苯基被基团Q 其中Q具有结构并共价连接到苯基的碳原子上，其中L 1，L 2和L 3 3是 连接基团a，b和c分别是0或1，T 1，T 2和T 3是末端基团。 由Q组取代的聚合物增加了涂层的耐化学性。
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公开(公告)号：US07297465B2
公开(公告)日：2007-11-20
申请号：US10834553
申请日：2004-04-29
申请人： Huub Van Aert , Bert Groenendaal , Marc Van Damme
发明人： Huub Van Aert , Bert Groenendaal , Marc Van Damme
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , Y10S430/145
摘要： According to the present invention there is provided a positive-working lithographic printing plate precursor which comprises on a support having a hydrophilic surface or which is provided with a hydrophilic layer, an oleophilic coating comprising an infrared absorbing agent, an alkali-soluble polymeric binder and a polysiloxane which comprises at least one carboxylic acid group or a salt thereof. The disclosed printing plate precursor has an improved sensitivity and at the same time a high under exposure latitude and a high developer resistance.
摘要翻译： 根据本发明，提供了一种正性平版印刷版原版，其包含在具有亲水性表面或具有亲水层的支持体上，亲水性涂层包含红外线吸收剂，碱溶性聚合物粘合剂和 包含至少一个羧酸基团或其盐的聚硅氧烷。 所公开的印版前体具有改进的灵敏度，同时高曝光宽度和高显影剂阻力。
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公开(公告)号：US20060144269A1
公开(公告)日：2006-07-06
申请号：US10530992
申请日：2003-09-18
IPC分类号： B41N1/00
CPC分类号： C08G8/28 , B41C1/1008 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , C08L61/14
摘要： A polymer for a heat-sensitive lithographic printing plate precursor is disclosed wherein the polymer comprises a phenolic monomeric unit wherein the H atom of the hydroxy group of the phenyl group of the phenolic monomeric unit is replaced by a group comprising a N-imide group and wherein the substitution of the polymer increases the chemical resistance of the coating of the printing plate precursor.
摘要翻译： 公开了一种用于热敏平版印刷版前体的聚合物，其中聚合物包含酚单体单元，其中酚单体单元的苯基的羟基的H原子被包括N-酰亚胺基团和 其中聚合物的取代增加了印版前体的涂层的耐化学性。
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公开(公告)号：US20060060096A1
公开(公告)日：2006-03-23
申请号：US10530999
申请日：2003-09-30
IPC分类号： B41N1/14
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , C08G8/28 , C08L61/14
摘要： A polymer for a heat-sensitive lithographic printing plate precursor is disclosed wherein the polymer comprises a phenolic monomeric unit wherein the phenyl group of the phenolic monomeric unit is substituted by a group having the structure —S-(L)k-Q wherein S is covalently bound to a carbon atom of the phenyl group, L is a linking group, k is 0 or 1 and Q comprises a heterocyclic group and wherein the substitution of the polymer increases the chemical resistance of the coating of the printing plate precursor.
摘要翻译： 公开了一种用于热敏平版印刷版原版的聚合物，其中聚合物包含酚类单体单元，其中酚类单体单元的苯基被具有结构-S-（L） 其中S与苯基的碳原子共价键合，L是连接基团，k是0或1，Q包括杂环基团，其中聚合物的取代增加涂层的耐药性 印版前体。
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公开(公告)号：US07458320B2
公开(公告)日：2008-12-02
申请号：US10530992
申请日：2003-09-18
IPC分类号： G03F7/004
CPC分类号： C08G8/28 , B41C1/1008 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , C08L61/14
摘要： A polymer for a heat-sensitive lithographic printing plate precursor is disclosed wherein the polymer comprises a phenolic monomeric unit wherein the H atom of the hydroxy group of the phenyl group of the phenolic monomeric unit is replaced by a group comprising a N-imide group and wherein the substitution of the polymer increases the chemical resistance of the coating of the printing plate precursor.
摘要翻译： 公开了一种用于热敏平版印刷版前体的聚合物，其中聚合物包含酚单体单元，其中酚单体单元的苯基的羟基的H原子被包括N-酰亚胺基团和 其中聚合物的取代增加了印版前体的涂层的耐化学性。
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公开(公告)号：US07198877B2
公开(公告)日：2007-04-03
申请号：US10531627
申请日：2003-09-29
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , Y10S430/145
摘要： A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating comprising an infrared absorbing agent and a polymer, which comprises a phenolic monomeric unit wherein the phenyl group of the phenolic monomeric unit is substituted by a group having the structure —N═N-Q wherein the —N═N— group is covalently bound to a carbon atom of the phenyl group and wherein Q is an aromatic group and wherein the substitution increases the chemical resistance of the coating.
摘要翻译： 公开了一种热敏平版印刷版原版，其包含亲水载体和包含红外吸收剂和聚合物的亲油性涂层，其包含酚单体单元，其中酚单体单元的苯基被具有 结构-NNQ，其中-NN-基团与苯基的碳原子共价结合，并且其中Q是芳族基团，并且其中所述取代增加了涂层的耐化学性。
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9.发明授权Heat mode sensitive imaging element for making positive working printing plates 失效加热模式敏感成像元件，用于制作正性印刷版
公开(公告)号：US6152036A
公开(公告)日：2000-11-28
申请号：US280659
申请日：1999-03-29
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/24 , B41C2210/26 , B41C2210/264
摘要： The present invention is directed to a heat mode imaging element for making a lithographic printing plate including on a lithographic base with a hydrophilic surface, a first layer including a polymer, soluble in an aqueous alkaline solution, and a top layer on the same side of the lithographic base as the first layer. The top layer is IR-sensitive and unpenetrable for an alkaline developer. The first layer and the top layer may be one and the same layer. The top layer is characterized in that it contains at least one compound containing epoxy units in an amount between 20 and 500 mg/m.sup.2 and a hardener.
摘要翻译： 本发明涉及一种用于制造平版印刷版的热模式成像元件，该平版印刷版包括在具有亲水表面的光刻基底上，包含可溶于碱性水溶液的聚合物的第一层和位于同一侧的顶层 光刻基底为第一层。 顶层对于碱性显影剂是IR敏感的和不可穿透的。 第一层和顶层可以是同一层。 顶层的特征在于其含有至少一种含有20-500mg / m 2的环氧单元的化合物和一种硬化剂。
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10.发明授权Heat mode sensitive imaging element for making positive working printing plates 有权加热模式敏感成像元件，用于制作正性印刷版公开(公告)号：US06489079B1
公开(公告)日：2002-12-03
申请号：US09391421
申请日：1999-09-08
IPC分类号： G03F7004
CPC分类号： B41C1/1025 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/24 , B41N1/083 , Y10S430/165
摘要： According to the present invention there is provided a heat mode imaging element for making a lithographic printing plate comprising on a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer which top layer is IR-sensitive and unpenetrable for an alkaline developer wherein said first layer and said top layer may be one and the same layer; characterized in that said top layer contains at least one blockcopolymer in an amount between 0.5 and 500 mg/m2.
摘要翻译： 根据本发明，提供一种用于制造平版印刷版的热模式成像元件，该平版印刷版包括在具有亲水表面的平版印刷基底上，第一层包括可溶于碱性水溶液的聚合物和位于同一侧上的顶层 作为第一层的光刻基底，其顶层对于碱性显影剂是IR敏感的和不可穿透的，其中所述第一层和所述顶层可以是同一层; 其特征在于所述顶层含有至少一种0.5-500mg / m 2的嵌段共聚物。
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