-
公开(公告)号：US09336995B2
公开(公告)日：2016-05-10
申请号：US14249972
申请日：2014-04-10
Applicant: MKS Instruments, Inc.
Inventor： David J. Coumou , Michael L. Kirk , Daniel M. Gill
CPC classification number: H01J37/32082 , H01J37/32155 , H01J37/32165 , H01J37/32935
Abstract: A system has a first RF generator and a second RF generator. The first RF generator controls the frequency of the second RF generator. The first RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit scales the frequency of the first RF generator to control the frequency of the second RF generator.
Abstract translation: 系统具有第一RF发生器和第二RF发生器。 第一个RF发生器控制第二个RF发生器的频率。 第一RF发生器包括电源，传感器和传感器信号处理单元。 传感器信号处理单元耦合到电源和传感器。 传感器信号处理单元缩放第一RF发生器的频率以控制第二RF发生器的频率。
-
公开(公告)号：US09291649B2
公开(公告)日：2016-03-22
申请号：US13828628
申请日：2013-03-14
Applicant: MKS Instruments, Inc.
Inventor： Dennis M. Brown , David J. Coumou , Raymond Brooks
CPC classification number: G01R19/00 , G01R15/181 , H01F27/2804 , H01F38/30 , H01F2038/305 , H05H1/46 , H05H2001/4682
Abstract: A radio frequency sensor system includes a printed circuit board (PCB). The PCB includes a first exterior layer, a second exterior layer, a first interior layer, a second interior layer, and an inner perimeter that defines an aperture through the PCB. The PCB also includes a first loop. The first loop includes a first plurality of sensor pads coupled to a first plurality of vias by a first plurality of traces. The first plurality of sensor pads is arranged on the inner perimeter. The PCB also includes a second loop. The second loop includes a second plurality of sensor pads coupled to a second plurality of vias by a second plurality of traces. The second plurality of sensor pads is arranged on the inner perimeter. A core ring is embedded within the first interior layer proximal to the first plurality of sensor pads, the first plurality of vias, and the first plurality of traces. A center conductor, for carrying RF current, extends through the aperture. The first and second loops generate an electrical signal based on the first and second plurality of sensor pads, the first and second plurality of vias, the first and second plurality of traces, and the core ring.
Abstract translation: 射频传感器系统包括印刷电路板（PCB）。 PCB包括第一外部层，第二外部层，第一内部层，第二内部层和限定通过PCB的孔的内部周边。 PCB还包括第一个回路。 第一环包括通过第一多个迹线耦合到第一多个通孔的第一多个传感器焊盘。 第一组多个传感器垫布置在内周上。 PCB还包括第二个回路。 第二环路包括通过第二多个迹线耦合到第二多个通孔的第二多个传感器焊盘。 第二组传感器垫布置在内周上。 核心环被嵌入到靠近第一多个传感器焊盘，第一多个通孔和第一多个迹线的第一内部层内。 用于承载RF电流的中心导体延伸穿过孔。 第一和第二回路基于第一和第二多个传感器焊盘，第一和第二多个通孔，第一和第二多个迹线以及芯环产生电信号。
-
公开(公告)号：US09041292B2
公开(公告)日：2015-05-26
申请号：US13764285
申请日：2013-02-11
Applicant: MKS Instruments, Inc.
Inventor： David J. Coumou
CPC classification number: H05B31/26 , H01J37/32082 , H01J37/32174 , H05H1/46
Abstract: Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit controls the phase and/or the frequency of a RF generator.
-
公开(公告)号：US11531312B2
公开(公告)日：2022-12-20
申请号：US17232950
申请日：2021-04-16
Applicant: MKS Instruments, Inc.
Inventor： David J. Coumou , Yuriy Elner , Aung Toe , Daniel M. Gill , Eldridge M. Mount, IV , Shaun Smith
IPC: G05B19/042 , H01L21/67 , H01J37/32
Abstract: A power supply control system includes a power generator for providing a signal to a load. The power generator includes a power controller controlling a power amplifier. The power generator includes an adaptive controller for varying the output signal controlling the power amplifier. The adaptive controller compares an error between a measured output and a predicted output to determine adaptive values applied to the power controller. The power generator also includes a sensor that generates an output signal that is digitized and processed. The sensor signal is mixed with a constant K. The constant K is varied to vary the processing of the sensor output signal. The value K may be commutated based on the phase, frequency, or both phase and frequency, and the bandwidth of K is determined by coupled power in the sensor output signal.
-
公开(公告)号：US10692698B2
公开(公告)日：2020-06-23
申请号：US16509088
申请日：2019-07-11
Applicant: MKS Instruments, Inc.
Inventor： David J. Coumou , Ross Reinhardt , Yuriy Elner , Daniel M. Gill , Richard Pham
IPC: H01J37/32
Abstract: A system for controlling RF power supplies applying power to a load, such as a plasma chamber, includes a master power supply and a slave power supply. The master power supply provides a control signal, such as a frequency and phase signal, to the slave power supply. The slave power supply receives the frequency and phase signal and also receives signals characteristic of the spectral emissions detected from the load. The slave RF power supply varies the phase and power of its RF output signal applied to the load. Varying the power controls the width of an ion distribution function, and varying the phase controls a peak of the ion distribution. Depending upon the coupling between the RF generators and the load, different spectral emissions are detected, including first harmonics, second harmonics, and, in the case of a dual frequency drive system, intermodulation distortion.
-
Patent Agency Ranking
公开(公告)号：US10666206B2
公开(公告)日：2020-05-26
申请号：US15846922
申请日：2017-12-19
Applicant: MKS Instruments, Inc.
Inventor： David J. Coumou , Ross Reinhardt , Yuriy Elner , Daniel M. Gill
Abstract: A radio frequency (RF) control system including a RF generator having a power amplifier that outputs a RF signal and a controller. A matching network receives the RF signal and generates at least one RF output signal. In a first mode of operation, the controller enables adjustment of the frequency of the RF signal and a tune element of the matching network to achieve an impedance match and in a second mode of operation the controller enables adjustment of only the tune element of the matching network to achieve an impedance match while the frequency is adjusted to a target frequency. The RF controls system operates in a continuous and pulse mode of operation.
-
公开(公告)号：US20190318916A1
公开(公告)日：2019-10-17
申请号：US16377522
申请日：2019-04-08
Applicant: Tokyo Electron Limited , MKS Instruments, Inc.
Inventor： Yusuke Yoshida , Sergey Voronin , Alok Ranjan , David J. Coumou , Scott E. White
IPC: H01J37/32
Abstract: Plasma ion energy distribution for ions having different masses is controlled by controlling the relationship between a base RF frequency and a harmonic RF frequency. By the controlling the RF power frequencies, characteristics of the plasma process may be changed based on ion mass. The ions that dominate etching may be selectively based upon whether an ion is lighter or heavier than other ions. Similarly, atomic layer etch processes may be controlled such that the process may be switched between a layer modification step and a layer etch step though adjustment of the RF frequencies. Such switching is capable of being performed within the same gas phase of the plasma process. The control of the RF power includes controlling the phase difference and/or amplitude ratios between a base RF frequency and a harmonic frequency based upon the detection of one or more electrical characteristics within the plasma apparatus.
-
公开(公告)号：US20190318913A1
公开(公告)日：2019-10-17
申请号：US16377501
申请日：2019-04-08
Applicant: Tokyo Electron Limited , MKS Instruments, Inc.
Inventor： Yusuke Yoshida , Sergey Voronin , Alok Ranjan , David J. Coumou , Scott E. White
Abstract: Multiple harmonic frequency components are used for plasma excitation in a plasma process. Relative amplitude and/or phase shift between the different frequency components is controlled so as to provide desired ion energy plasma properties. The relative amplitude and/or phase shift may be controlled without direct and/or manual ion energy measurements. Rather, the ion energy within the plasma may be dynamically controlled by monitoring one or more electrical characteristics within the plasma apparatus, such as for example, impedance levels, electrical signals in the radio frequency (RF) generator, electrical signals in a the matching networks, and electrical signals in other circuits of the plasma processing apparatus. The monitoring and control of the ion energy may be accomplished dynamically during the plasma process so as to maintain a desired ion energy distribution.
-
公开(公告)号：US10395895B2
公开(公告)日：2019-08-27
申请号：US14837512
申请日：2015-08-27
Applicant: MKS Instruments, Inc.
Inventor： David J. Coumou , Ross Reinhardt , Yuriy Elner , Daniel M. Gill , Richard Pham
IPC: H01J37/32
Abstract: A system for controlling RF power supplies applying power to a load, such as a plasma chamber, includes a master power supply and a slave power supply. The master power supply provides a control signal, such as a frequency and phase signal, to the slave power supply. The slave power supply receives the frequency and phase signal and also receives signals characteristic of the spectral emissions detected from the load. The slave RF power supply varies the phase and power of its RF output signal applied to the load. Varying the power controls the width of an ion distribution function, and varying the phase controls a peak of the ion distribution. Depending upon the coupling between the RF generators and the load, different spectral emissions are detected, including first harmonics, second harmonics, and, in the case of a dual frequency drive system, intermodulation distortion.
-
10.发明授权公开(公告)号：US10269546B1
公开(公告)日：2019-04-23
申请号：US15876189
申请日：2018-01-21
Applicant: MKS Instruments, Inc.
Inventor： David J. Coumou , Dennis M. Brown , Eldridge M. Mount, IV
Abstract: An RF generator in a dual frequency RF generation system. The RF generator detects IMD components resulting from interaction of the two frequencies. The IMD is reduced by adjusting the phase of the RF signal output by the RF generator. In various configurations, the IMD may also be reduced by applying a power adjustment value.
-
-
-
-
-
-
-
-
-
Search Results
26
records
(took 0.021 seconds)
