公开(公告)号：US20190204483A1

公开(公告)日：2019-07-04

申请号：US16289334

申请日：2019-02-28

Applicant: Lumentum Operations LLC

Inventor： John Michael MILLER ,  Gonzalo WILLS ,  Lu TIAN ,  Michael O'LEARY

IPC: G02B5/18 ,  G02B27/42

Abstract: A diffraction grating may include a substrate. The diffraction grating may include an etch stop layer to prevent etching of the substrate. The etch stop layer may be deposited on the substrate. The diffraction grating may include a marker layer to indicate an etch end-point associated with etching of a dielectric layer. The marker layer may be deposited on a portion of the etch stop layer. The diffraction grating may include the dielectric layer to form a grating layer after being etched. The dielectric layer may be deposited on at least the marker layer.

公开(公告)号：US20170307785A1

公开(公告)日：2017-10-26

申请号：US15495265

申请日：2017-04-24

Applicant: Lumentum Operations LLC

Inventor： John Michael Miller ,  Joel MILGRAM ,  Karen Denise HENDRIX ,  Michael O’LEARY ,  Hery DJIE ,  Lu TIAN ,  Paul COLBOURNE

IPC: G02B1/12 ,  G02B5/30 ,  G02B1/11 ,  G02B5/18 ,  G03F7/00 ,  G02B27/28

CPC classification number: G02B1/12 ,  G02B1/11 ,  G02B5/1809 ,  G02B5/3083 ,  G02B27/286 ,  G03F7/0005

Abstract: A zoned waveplate has a series of transversely stacked birefringent zones alternating with non-birefringent zones. The birefringent and non-birefringent zones are integrally formed upon an AR-coated face of a single substrate by patterning the AR coated face of the substrate with zero-order sub-wavelength form-birefringent gratings configured to have a target retardance. The layer structure of the AR coating is designed to provide the target birefringence in the patterned zones and the reflection suppression.

公开(公告)号：US20170017028A1

公开(公告)日：2017-01-19

申请号：US14798764

申请日：2015-07-14

Applicant: Lumentum Operations LLC

Inventor： John Michael MILLER ,  Joel MILGRAM ,  Karen Denise HENDRIX ,  Michael O'LEARY ,  Hery DJIE ,  Lu TIAN ,  Paul COLBOURNE

IPC: G02B5/30 ,  G02B1/12 ,  G03F7/00 ,  G02B1/11

CPC classification number: G02B1/12 ,  G02B1/11 ,  G02B5/1809 ,  G02B5/3083 ,  G02B27/286 ,  G03F7/0005

Abstract: A zoned waveplate has a series of transversely stacked birefringent zones alternating with non-birefringent zones. The birefringent and non-birefringent zones are integrally formed upon an AR-coated face of a single substrate by patterning the AR coated face of the substrate with zero-order sub-wavelength form-birefringent gratings configured to have a target retardance. The layer structure of the AR coating is designed to provide the target birefringence in the patterned zones and the reflection suppression.

Abstract translation: 分区波片具有与非双折射区交替的一系列横向堆叠的双折射区。 双折射和非双折射区域通过用配置成具有目标延迟的零级亚波长形式双折射光栅图案化衬底的AR涂覆面而整体地形成在单个衬底的涂覆AR的面上。 AR涂层的层结构被设计成在图案化区域中提供目标双折射和反射抑制。

公开(公告)号：US20180031744A1

公开(公告)日：2018-02-01

申请号：US15224070

申请日：2016-07-29

Applicant: Lumentum Operations LLC

Inventor： John Michael MILLER ,  Gonzalo WILLS ,  Lu TIAN ,  Michael O'LEARY

IPC: G02B5/18 ,  G02B27/42

CPC classification number: G02B5/1857 ,  G02B5/1814 ,  G02B5/1861 ,  G02B27/4261

Abstract: A diffraction grating may include a substrate. The diffraction grating may include an etch stop layer to prevent etching of the substrate. The etch stop layer may be deposited on the substrate. The diffraction grating may include a marker layer to indicate an etch end-point associated with etching of a dielectric layer. The marker layer may be deposited on a portion of the etch stop layer. The diffraction grating may include the dielectric layer to form a grating layer after being etched. The dielectric layer may be deposited on at least the marker layer.