Excimer gas purification
    1.
    发明授权
    Excimer gas purification 有权
    准分子气体净化

    公开(公告)号:US09478934B1

    公开(公告)日:2016-10-25

    申请号:US14868535

    申请日:2015-09-29

    CPC classification number: H01S3/134 H01S3/036 H01S3/225

    Abstract: The disclosure relates to the removal of hydrogen fluoride (HF) from an excimer laser either in operation or in standby using a metal halide salt reactor. Removal of HF is desirable because the contaminant not only absorbs laser emission, thus reducing laser power, but it is also chemically reactive, and degrades the lifetime of internal laser components. The metal halide salt reactor may be provided either in the laser vessel or in an external conduit loop.

    Abstract translation: 本公开涉及在使用金属卤化物盐反应器的操作或备用中从准分子激光器除去氟化氢(HF)。 需要去除HF是因为污染物不仅吸收激光发射,从而降低激光功率,而且还具有化学反应性,并降低了内部激光部件的寿命。 金属卤化物盐反应器可以设置在激光容器中或外部导管回路中。

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