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公开(公告)号:US20230082643A1
公开(公告)日:2023-03-16
申请号:US17473712
申请日:2021-09-13
Applicant: Lawrence Livermore National Security, LLC
Inventor: Tom Nakotte , Jinkyu Han , Anna Hiszpanski
Abstract: A product includes a solution comprising Ag2Se quantum dots in a solvent. The solution is colloidally stable for at least one week. A product includes a solid layer formed of Ag2Se quantum dots. The layer is at least 100 nm thick. The layer is physically characterized by a substantial absence of defects therein. A process includes forming a solution of Ag2Se quantum dots and adding at least acetonitrile to the solution. The process further includes separating the Ag2Se quantum dots from the solution and washing the Ag2Se quantum dots at least two times in a solution comprising at least acetonitrile. The process further includes redispersing the washed Ag2Se quantum dots in a nonpolar solvent to create a colloidal suspension.
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2.
公开(公告)号:US20180242465A1
公开(公告)日:2018-08-23
申请号:US15441146
申请日:2017-02-23
Applicant: Lawrence Livermore National Security, LLC
Inventor: Anna Hiszpanski , Thomas Yong-Jin Han , Carla Lim Watson , Timothy Dexter Yee
CPC classification number: C09K13/00 , B81C1/00031 , B81C1/00126 , B81C1/00206 , B81C1/00484 , B81C1/00531 , B81C2201/0149 , B81C2201/0194 , B82Y40/00 , H01B1/22 , H01B1/24 , H01L31/022466 , H01L31/1884 , H05K1/0274 , H05K2201/0108 , H05K2201/026 , Y10S977/888
Abstract: According to one embodiment, a method for creating a metal nanowire mesh the method includes forming a first layer of block copolymer, causing the block copolymer to become aligned in approximately straight lines, infiltrating one phase of the block copolymer with a metal, and removing the block copolymer where the metal remains after the block copolymer is removed. Furthermore, the method includes forming a second layer of block copolymer, causing the block copolymer in the second layer to become ordered in approximately straight lines oriented at an angle from greater than 0 degrees to 90 degrees from a mean direction of longitudinal axes of the remaining metal, infiltrating one phase of the block copolymer in the second layer with a second metal, and removing the block copolymer in the second layer where the second metal remains above the metal after the block copolymer in the second layer is removed.
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