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公开(公告)号:US08250695B2
公开(公告)日:2012-08-28
申请号:US12573500
申请日:2009-10-05
申请人: Lakshmanan Karuppiah , Dan Zhang , Simon Yavelberg , Jim K. Atkinson , Hung Chih Chen , Noel Manto , Jonathan Domin
发明人: Lakshmanan Karuppiah , Dan Zhang , Simon Yavelberg , Jim K. Atkinson , Hung Chih Chen , Noel Manto , Jonathan Domin
IPC分类号: A47L25/00
CPC分类号: B08B1/04
摘要: Embodiments described herein relate to an apparatus and method for a roller assembly that may be utilized in a brush cleaning module. In one embodiment, a roller assembly is described. The roller assembly includes an annular groove having at least two substantially parallel opposing sidewalls adapted to contact the major surfaces of a substrate along a periphery of the substrate, each of the opposing sidewalls comprising a compressible material having a pre-compressed dimension that is less than a thickness of the periphery of the substrate.
摘要翻译: 本文所述的实施例涉及可用于刷清洁模块中的用于辊组件的装置和方法。 在一个实施例中,描述了辊组件。 辊组件包括具有至少两个基本上平行的相对侧壁的环形凹槽,所述至少两个基本上平行的相对侧壁适于沿着衬底的周边接触衬底的主表面,每个相对的侧壁包括具有预压缩尺寸小于 衬底的周边的厚度。
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公开(公告)号:US20110079245A1
公开(公告)日:2011-04-07
申请号:US12573500
申请日:2009-10-05
申请人: Lakshmanan Karuppiah , Dan Zhang , Simon Yavelberg , Jim K. Atkinson , Hung Chih Chen , Noel Manto , Jonathan Domin
发明人: Lakshmanan Karuppiah , Dan Zhang , Simon Yavelberg , Jim K. Atkinson , Hung Chih Chen , Noel Manto , Jonathan Domin
CPC分类号: B08B1/04
摘要: Embodiments described herein relate to an apparatus and method for a roller assembly that may be utilized in a brush cleaning module. In one embodiment, a roller assembly is described. The roller assembly includes an annular groove having at least two substantially parallel opposing sidewalls adapted to contact the major surfaces of a substrate along a periphery of the substrate, each of the opposing sidewalls comprising a compressible material having a pre-compressed dimension that is less than a thickness of the periphery of the substrate.
摘要翻译: 本文所述的实施例涉及可用于刷清洁模块中的用于辊组件的装置和方法。 在一个实施例中,描述了辊组件。 辊组件包括具有至少两个基本上平行的相对侧壁的环形凹槽,所述至少两个基本上平行的相对侧壁适于沿着衬底的周边接触衬底的主表面,每个相对的侧壁包括具有预压缩尺寸小于 衬底的周边的厚度。
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公开(公告)号:US07044832B2
公开(公告)日:2006-05-16
申请号:US10988647
申请日:2004-11-15
申请人: Alpay Yilmaz , Simon Yavelberg , Toshikazu Tomita , Hui Chen , Noel Manto , David J. Lischka , Hung Chih Chen
发明人: Alpay Yilmaz , Simon Yavelberg , Toshikazu Tomita , Hui Chen , Noel Manto , David J. Lischka , Hung Chih Chen
IPC分类号: B24B49/00
CPC分类号: B24B37/345
摘要: Embodiments of a load cup for transferring a substrate are provided. The load cup includes a pedestal assembly having a substrate support and a de-chucking nozzle. The de-chucking nozzle is positioned to flow a fluid between the polishing head and the back side of a substrate during transfer of the substrate from the polishing head to the substrate support.
摘要翻译: 提供了用于转移衬底的负载杯的实施例。 负载杯包括具有基板支撑件和去夹紧喷嘴的基座组件。 在将基板从抛光头转移到基板支撑件的过程中,去夹紧喷嘴定位成使流体在基板的抛光头和背面之间流动。
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公开(公告)号:US20050176349A1
公开(公告)日:2005-08-11
申请号:US10988647
申请日:2004-11-15
申请人: Alpay Yilmaz , Simon Yavelberg , Toshikazu Tomita , Hui Chen , Noel Manto , David Lischka , Hung Chen
发明人: Alpay Yilmaz , Simon Yavelberg , Toshikazu Tomita , Hui Chen , Noel Manto , David Lischka , Hung Chen
CPC分类号: B24B37/345
摘要: Embodiments of a load cup for transferring a substrate are provided. The load cup includes a pedestal assembly having a substrate support and a de-chucking nozzle. The de-chucking nozzle is positioned to flow a fluid between the polishing head and the back side of a substrate during transfer of the substrate from the polishing head to the substrate support.
摘要翻译: 提供了用于转移衬底的负载杯的实施例。 负载杯包括具有基板支撑件和去夹紧喷嘴的基座组件。 在将基板从抛光头转移到基板支撑件的过程中,去夹紧喷嘴定位成使流体在基板的抛光头和背面之间流动。
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公开(公告)号:US20080291448A1
公开(公告)日:2008-11-27
申请号:US12124135
申请日:2008-05-20
申请人: Hui Chen , Noel Manto , Haochuan Zhang , Alpay Yilmaz
发明人: Hui Chen , Noel Manto , Haochuan Zhang , Alpay Yilmaz
IPC分类号: G01B11/00
CPC分类号: G01B11/002
摘要: Methods and apparatus are provided for locating a notch and/or a center of the notch of a substrate. An exemplary method includes rotating a substrate; illuminating an edge of the substrate with a light beam as the substrate rotates; detecting a change in light intensity of the light beam as the substrate rotates; determining a rough location of a notch in the edge of the substrate based on a position of the substrate when the change in light intensity of the light beam is detected; and reversing a rotational direction of the substrate to determine a fine location of the notch in the edge of the substrate. Numerous other aspects are provided.
摘要翻译: 提供了用于定位基板的凹口和/或中心的方法和装置。 一种示例性方法包括旋转衬底; 当衬底旋转时,用光束照射衬底的边缘; 检测基板旋转时光束的光强度的变化; 当检测到光束的光强度的变化时,基于衬底的位置确定衬底的边缘中的凹口的粗略位置; 并且反转衬底的旋转方向以确定衬底边缘中凹口的精细位置。 提供了许多其他方面。
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公开(公告)号:US20080006785A1
公开(公告)日:2008-01-10
申请号:US11683420
申请日:2007-03-07
申请人: Hui Chen , Haochuan Zhang , Noel Manto
发明人: Hui Chen , Haochuan Zhang , Noel Manto
IPC分类号: G01N21/86
CPC分类号: G01V8/12
摘要: In a first aspect, a first apparatus is provided. The first apparatus includes a through-beam sensor coupled to a scrubber and adapted to detect a notch or flat of a substrate in the scrubber during processing. The through-beam sensor has (1) an emitter facing a first major surface of a substrate in the scrubber and adapted to transmit a beam toward an edge of the first major surface; and (2) a receiver facing a second major surface of the substrate and adapted to receive the beam transmitted from the emitter when the edge of the substrate does not obstruct the beam. Numerous other aspects are provided.
摘要翻译: 在第一方面中,提供了一种第一装置。 第一装置包括耦合到洗涤器并适于在处理期间检测洗涤器中的基板的凹口或平面的通过光束传感器。 通过光束传感器具有(1)发射器面向洗涤器中的基板的第一主表面并且适于将光束传送到第一主表面的边缘; 和(2)接触器,其面对衬底的第二主表面,并且适于在衬底的边缘不阻挡光束时接收从发射器发射的光束。 提供了许多其他方面。
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