摘要:
A discharge is initiated in a discharge space defined between the front glass substrate and the back glass substrate, whereby vacuum ultraviolet light is generated from a discharge gas filling the discharge space and excite phosphor layers. Each of the phosphor layers is formed of a firs phosphor having a resistance to an Xe resonance line, and absorbing the Xe resonance line and ultraviolet light in a longer wavelength range than the Xe resonance line and the Xe molecular beam but allowing the Xe molecular beam to pass through, and a second phosphor absorbing the Xe resonance line and the Xe molecular beam and generating ultraviolet light in a longer wavelength range than the Xe resonance line and the Xe molecular beam.
摘要:
A phosphor layer is provided on a back glass substrate placed opposite a front glass substrate with a discharge space in between, and formed in a double-layer structure consisting of a first phosphor layer and a second phosphor layer having its surface covered by the first phosphor layer. The first phosphor layer is formed of materials that permit the passing-through of a xenon molecular beam but absorb a xenon resonance line in the vacuum ultraviolet light generated from a discharge gas by means of a discharge, and have a higher resistance to the resonance line than that of the second phosphor layer. The second phosphor layer is formed of materials that have, as compared with the first phosphor layer, a higher light-emission brightness based on the xenon molecular beam in the vacuum ultraviolet light generated from the discharge gas by means of the discharge.
摘要:
A forming method of a protective film made of oxide containing any one of calcium oxide (CaO), strontium oxide (SrO) and barium oxide (BaO) and having a higher band gap than that of magnesium oxide (MgO) (higher than 7.9 eV) is provided. By adjusting a time constant of a protective film to a predetermined value or larger, the voltage drop time is adjusted so as to be usable for a plasma display panel. At this time, the time constant τ(=C×R) defined by the discharge capacitance C and the protective film resistance R is referenced.
摘要:
A forming method of a protective film made of oxide containing any one of calcium oxide (CaO), strontium oxide (SrO) and barium oxide (BaO) and having a higher band gap than that of magnesium oxide (MgO) (higher than 7.9 eV) is provided. By adjusting a time constant of a protective film to a predetermined value or larger, the voltage drop time is adjusted so as to be usable for a plasma display panel. At this time, the time constant τ(=C×R) defined by the discharge capacitance C and the protective film resistance R is referenced.