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    Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film
    2.
    发明授权
    Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film 有权
    图案形成方法，光化射线敏感或辐射敏感树脂组合物和抗蚀剂膜

    公开(公告)号：US09316910B2

    公开(公告)日：2016-04-19

    申请号：US13406306

    申请日：2012-02-27

    申请人： Shohei Kataoka ,  Hidenori Takahashi ,  Shuhei Yamaguchi ,  Shoichi Saitoh ,  Michihiro Shirakawa ,  Fumihiro Yoshino

    发明人： Shohei Kataoka ,  Hidenori Takahashi ,  Shuhei Yamaguchi ,  Shoichi Saitoh ,  Michihiro Shirakawa ,  Fumihiro Yoshino

    IPC分类号： G03F7/20 ,  G03F7/039

    CPC分类号： G03F7/0397

    摘要： Provided is a pattern forming method that is excellent in roughness performance such as line width roughness and exposure latitude, and an actinic-ray-sensitive or radiation-sensitive resin composition and a resist film used for the pattern forming method.The pattern forming method includes (1) forming a film using an actinic-ray-sensitive or radiation-sensitive resin composition containing a resin that includes 65 mol % or more of a repeating unit having a group which generates a polar group by being degraded by the action of an acid based on all repeating units in the resin and at least one kind of repeating unit represented by the following General Formula (I) or (II), (2) exposing the film, and (3) developing the exposed film using a developer that contains an organic solvent.

    摘要翻译： 提供了一种图案形成方法，其具有优异的粗糙度性能，例如线宽粗糙度和曝光宽容度，以及用于图案形成方法的光化学敏感或辐射敏感性树脂组合物和抗蚀剂膜。 图案形成方法包括：（1）使用含有树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜，所述树脂组合物包含65摩尔％以上的具有通过降解产生极性基团的基团的重复单元 基于树脂中所有重复单元的酸的作用和由以下通式（I）或（II）表示的至少一种重复单元，（2）使膜曝光，和（3）显影曝光膜 使用含有机溶剂的显影剂。

    PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING SAME
    8.
    发明申请
    PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING SAME 审中-公开
    使用相同的光敏组合物和图案形成方法

    公开(公告)号：US20120219910A1

    公开(公告)日：2012-08-30

    申请号：US13468871

    申请日：2012-05-10

    申请人： Akinori Shibuya ,  Michihiro Shirakawa

    发明人： Akinori Shibuya ,  Michihiro Shirakawa

    IPC分类号： G03F7/20 ,  G03F7/027

    CPC分类号： G03F7/0397 ,  G03F7/2041

    摘要： A photosensitive composition comprises (A) a resin whose solubility in an alkali developer is increased by the action of an acid, and (B) a compound that generates an acid when exposed to actinic rays or radiation, wherein the resin (A) contains two or more repeating units respectively having acid-decomposable groups that are different from each other in the acid decomposition ratio at an image formation sensitivity.

    摘要翻译： 感光性组合物包含（A）通过酸的作用在碱性显影剂中的溶解度增加的树脂，（B）当暴露于光化学射线或辐射时产生酸的化合物，其中树脂（A）含有两种 或更多个重复单元，其分别具有在成像灵敏度下的酸分解比例彼此不同的酸可分解基团。

    ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING SAME
    10.
    发明申请
    ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING SAME 有权
    丙酰基敏感性或辐射敏感性树脂组合物和使用其的图案形成方法

    公开(公告)号：US20100009288A1

    公开(公告)日：2010-01-14

    申请号：US12499515

    申请日：2009-07-08

    申请人： Takayuki Kato ,  Michihiro Shirakawa ,  Hyou Takahashi

    发明人： Takayuki Kato ,  Michihiro Shirakawa ,  Hyou Takahashi

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/0045 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/12 ,  C07C309/13 ,  C07C309/19 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

    摘要： An actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin that exhibits an increased solubility in an alkali developer when acted on by an acid, and (B) at least two types of sulfonic acid generators that generate a sulfonic acid when exposed to actinic rays or radiation, wherein the two types of sulfonic acid generators (B) consist of sulfonic acid generators (B1) and (B2) satisfying the following requirements, namely the sulfonic acid generator (B1) generates a sulfonic acid composed of 9 to 20 elements with an acid strength (pKa) satisfying the relationship pKa pKa≧−3.50, provided that no hydrogen atom is included in the number of elements of the generated acids.

    摘要翻译： 光化射线敏感或辐射敏感性树脂组合物包含（A）当由酸引起的在碱显影剂中表现出增加的溶解度的树脂，和（B）至少两种产生磺酸的磺酸产生剂 当暴露于光化学射线或辐射时，其中两种磺酸发生剂（B）由满足以下要求的磺酸发生剂（B1）和（B2）组成，即磺酸发生剂（B1）产生由 9〜20个具有满足pKa <-3.50的关系的酸强度（pKa）的元素，并且磺酸发生剂（B2）产生酸度（pKa）为17以上的酸，其浓度满足关系-2.00> pKa > = - 3.50，条件是所产生的酸的元素数目中不包括氢原子。